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1. (WO2018044821) REDUCING RESIDUAL MONOMER CONTENT IN COPOLYMERS OF STYRENE AND VINYLPYRIDINE
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2018/044821 International Application No.: PCT/US2017/048984
Publication Date: 08.03.2018 International Filing Date: 29.08.2017
IPC:
C08F 6/06 (2006.01) ,C08F 6/12 (2006.01) ,C08F 6/10 (2006.01) ,C08L 25/08 (2006.01) ,C08L 25/10 (2006.01)
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
6
Post-polymerisation treatments
06
Treatment of polymer solutions
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
6
Post-polymerisation treatments
06
Treatment of polymer solutions
12
Separation of polymers from solutions
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
6
Post-polymerisation treatments
06
Treatment of polymer solutions
10
Removal of volatile materials, e.g. monomers, solvents
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
L
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
25
Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Compositions of derivatives of such polymers
02
Homopolymers or copolymers of hydrocarbons
04
Homopolymers or copolymers of styrene
08
Copolymers of styrene
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
L
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
25
Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Compositions of derivatives of such polymers
02
Homopolymers or copolymers of hydrocarbons
04
Homopolymers or copolymers of styrene
08
Copolymers of styrene
10
with conjugated dienes
Applicants:
NOVUS INTERNATIONAL INC. [US/US]; 20 Research Park Drive St. Charles, Missouri 63304, US
Inventors:
WANG, Xiaojun; US
ARHANCET, Graciela B.; US
EMBSE, Richard Vonder; US
HUME, John; US
Agent:
BISSEN, Shirley T.; US
CRAWFORD, Bradley; US
DOTY, Kathryn; US
JOHNSON, Charles A.; US
KIRLEY, Morgan J.; US
KREPEL, Allison; US
NEALEY, Tara A.; US
RILEY-VARGAS, Rebecca; US
Priority Data:
62/381,42530.08.2016US
62/443,54406.01.2017US
Title (EN) REDUCING RESIDUAL MONOMER CONTENT IN COPOLYMERS OF STYRENE AND VINYLPYRIDINE
(FR) RÉDUCTION DE LA TENEUR EN MONOMÈRES RÉSIDUELS DANS DES COPOLYMÈRES DE STYRÈNE ET DE VINYLPYRIDINE
Abstract:
(EN) Copolymers of styrene and vinylpyridine having residual monomer levels of less than about 1000 parts per billion and processes for preparing said copolymers.
(FR) L'invention concerne des copolymères de styrène et de vinylpyridine présentant des taux de monomères résiduels inférieurs à environ 1 000 parties par milliard et des procédés de préparation desdits copolymères.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)