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1. (WO2018044427) HUMIC ACID-DERIVED CONDUCTIVE FOAMS AND DEVICES
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2018/044427 International Application No.: PCT/US2017/043494
Publication Date: 08.03.2018 International Filing Date: 24.07.2017
IPC:
B32B 5/18 (2006.01) ,C01B 32/182 (2017.01) ,C01B 32/184 (2017.01) ,B82Y 40/00 (2011.01) ,B05D 1/36 (2006.01) ,B05D 1/40 (2006.01) ,C08G 101/00 (2006.01)
B PERFORMING OPERATIONS; TRANSPORTING
32
LAYERED PRODUCTS
B
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
5
Layered products characterised by the non-homogeneity or physical structure of a layer
18
characterised by features of a layer containing foamed or specifically porous material
[IPC code unknown for C01B 32/182][IPC code unknown for C01B 32/184]
B PERFORMING OPERATIONS; TRANSPORTING
82
NANO-TECHNOLOGY
Y
SPECIFIC USES OR APPLICATIONS OF NANO-STRUCTURES; MEASUREMENT OR ANALYSIS OF NANO-STRUCTURES; MANUFACTURE  OR TREATMENT OF NANO-STRUCTURES
40
Manufacture or treatment of nano-structures
B PERFORMING OPERATIONS; TRANSPORTING
05
SPRAYING OR ATOMISING IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
D
PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
1
Processes for applying liquids or other fluent materials
36
Successively applying liquids or other fluent materials, e.g. without intermediate treatment
B PERFORMING OPERATIONS; TRANSPORTING
05
SPRAYING OR ATOMISING IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
D
PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
1
Processes for applying liquids or other fluent materials
40
Distributing applied liquids or other fluent materials by members moving relatively to surface
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
G
MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
101
Manufacture of cellular products
Applicants:
NANOTEK INSTRUMENTS, INC. [US/US]; 1240 McCook Ave Dayton, Ohio 45405, US
Inventors:
ZHAMU, Aruna; US
JANG, Bor Z.; US
Agent:
RUTISER, Claire; US
Priority Data:
15/251,84130.08.2016US
15/251,84930.08.2016US
Title (EN) HUMIC ACID-DERIVED CONDUCTIVE FOAMS AND DEVICES
(FR) MOUSSES CONDUCTRICES DÉRIVÉES DE L'ACIDE HUMIQUE ET DISPOSITIFS
Abstract:
(EN) A humic acid-derived foam composed of multiple pores and pore walls, wherein the pore walls contain single-layer or few-layer humic acid-derived hexagonal carbon atomic planes or sheets, the few-layer hexagonal carbon atomic planes or sheets have 2-10 layers of stacked hexagonal carbon atomic planes having an inter-planar spacing d?002#191 from 0.3354 nm to 0.40 nm as measured by X-ray diffraction, and the single-layer or few-layer hexagonal carbon atomic planes contain 0.01% to 25% by weight of non-carbon elements, and wherein the humic acid is selected from oxidized humic acid, reduced humic acid, fluorinated humic acid, chlorinated humic acid, brominated humic acid, iodized humic acid, hydrogenated humic acid, nitrogenated humic acid, doped humic acid, chemically functionalized humic acid, or a combination thereof.
(FR) L'invention concerne une mousse dérivée de l'acide humique composée de multiples pores et de parois de pores, dans laquelle les parois de pores contiennent des plans, ou feuilles, atomiques carbonés hexagonaux dérivés de l'acide humique de type à couche unique ou à quelques couches, les plans, ou feuilles, atomiques carbonés hexagonaux à quelques couches ont de 2 à 10 couches de plans atomiques carbonés hexagonaux empilés ayant un espacement inter-planaire d?002#191 de 0,3354 nm à 0,40 nm tel que mesuré par diffraction des rayons X, et les plans atomiques carbonés hexagonaux de type à couche unique ou à quelques couches contiennent de 0,01 % à 25 % en poids d'éléments non carbonés, et dans laquelle l'acide humique est sélectionné parmi l'acide humique oxydé, l'acide humique réduit, l'acide humique fluoré, l'acide humique chloré, l'acide humique bromé, l'acide humique iodé, l'acide humique hydrogéné, l’acide humique nitrogéné, l'acide humique dopé, l'acide humique fonctionnalisé chimiquement, ou une combinaison de ceux-ci.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)