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1. (WO2018043829) NOVEL COMPOUND, CORE-SHELL DYE, PHOTOSENSITIVE RESIN COMPOSITION COMPRISING SAME, AND COLOR FILTER
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Pub. No.: WO/2018/043829 International Application No.: PCT/KR2016/013795
Publication Date: 08.03.2018 International Filing Date: 28.11.2016
IPC:
C07C 271/24 (2006.01) ,C07C 271/12 (2006.01) ,C07C 211/64 (2006.01) ,C07C 233/64 (2006.01) ,C09B 62/62 (2006.01) ,C07D 471/14 (2006.01) ,C07D 245/04 (2006.01) ,G03F 7/105 (2006.01) ,G03F 7/032 (2006.01) ,G03F 7/00 (2006.01)
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
C
ACYCLIC OR CARBOCYCLIC COMPOUNDS
271
Derivatives of carbamic acid, i.e. compounds containing any of the groups the nitrogen atom not being part of nitro or nitroso groups
06
Esters of carbamic acids
08
having oxygen atoms of carbamate groups bound to acyclic carbon atoms
24
with the nitrogen atom of at least one of the carbamate groups bound to a carbon atom of a ring other than a six-membered aromatic ring
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
C
ACYCLIC OR CARBOCYCLIC COMPOUNDS
271
Derivatives of carbamic acid, i.e. compounds containing any of the groups the nitrogen atom not being part of nitro or nitroso groups
06
Esters of carbamic acids
08
having oxygen atoms of carbamate groups bound to acyclic carbon atoms
10
with the nitrogen atoms of the carbamate groups bound to hydrogen atoms or to acyclic carbon atoms
12
to hydrogen atoms or to carbon atoms of unsubstituted hydrocarbon radicals
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
C
ACYCLIC OR CARBOCYCLIC COMPOUNDS
211
Compounds containing amino groups bound to a carbon skeleton
62
Quaternary ammonium compounds
64
having quaternised nitrogen atoms bound to carbon atoms of six-membered aromatic rings
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
C
ACYCLIC OR CARBOCYCLIC COMPOUNDS
233
Carboxylic acid amides
64
having carbon atoms of carboxamide groups bound to carbon atoms of six-membered aromatic rings
C CHEMISTRY; METALLURGY
09
DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
B
ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES; MORDANTS; LAKES
62
Reactive dyes, i.e. dyes which form covalent bonds with the substrates or which polymerise with themselves
44
with the reactive group not directly attached to a heterocyclic ring
62
the reactive group being an ethylenimino or N-acylated ethylenimino group or a -CO-NH-CH2-CH2-X group, wherein X is a halogen atom, a quaternary ammonium group or O-acyl and acyl is derived from an organic or inorganic acid, or a beta-substituted ethylamine group
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
D
HETEROCYCLIC COMPOUNDS
471
Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, at least one ring being a six-membered ring with one nitrogen atom, not provided for by groups C07D451/-C07D463/251
12
in which the condensed system contains three hetero rings
14
Ortho-condensed systems
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
D
HETEROCYCLIC COMPOUNDS
245
Heterocyclic compounds containing rings of more than seven members having two nitrogen atoms as the only ring hetero atoms
04
condensed with carbocyclic rings or ring systems
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
09
characterised by structural details, e.g. supports, auxiliary layers
105
having substances, e.g. indicators, for forming visible images
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
027
Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
032
with binders
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Applicants:
삼성에스디아이 주식회사 SAMSUNG SDI CO., LTD. [KR/KR]; 경기도 용인시 기흥구 공세로 150-20 150-20 Gongse-ro, Giheung-gu, Yongin-si, Gyeonggi-do 17084, KR
Inventors:
서혜원 SEO, Hyewon; KR
박채원 PAK, Chaewon; KR
신명엽 SHIN, Myoungyoup; KR
신선웅 SHIN, Sunwoong; KR
정의수 JEONG, Euisoo; KR
최규범 CHOI, Kyunbuem; KR
Agent:
팬코리아특허법인 PANKOREA PATENT AND LAW FIRM; 서울시 강남구 논현로85길 70, 13층 13F, 70 Nonhyeon-ro 85-gil, Gangnam-gu, Seoul 06234, KR
Priority Data:
10-2016-011021929.08.2016KR
Title (EN) NOVEL COMPOUND, CORE-SHELL DYE, PHOTOSENSITIVE RESIN COMPOSITION COMPRISING SAME, AND COLOR FILTER
(FR) NOUVEAU COMPOSÉ, COLORANT NOYAU-ENVELOPPE, COMPOSITION DE RÉSINE PHOTOSENSIBLE LE CONTENANT ET FILTRE COULEUR
(KO) 신규한 화합물, 코어-쉘 염료, 이를 포함하는 감광성 수지 조성물 및 컬러필터
Abstract:
(EN) Provided are a compound represented by a specific formula, a core-shell dye comprising a core comprising the compound and a shell enclosing the core, a photosensitive resin composition comprising the core-shell dye, and a color filter manufactured using the photosensitive resin composition.
(FR) L'invention concerne un composé représenté par une formule spécifique, un colorant noyau-enveloppe comprenant un noyau comprenant le composé et une enveloppe entourant le noyau, une composition de résine photosensible comprenant le colorant noyau-enveloppe, et un filtre coloré fabriqué à l'aide de la composition de résine photosensible.
(KO) 특정 화학식으로 표시되는 화합물, 이를 포함하는 코어; 및 상기 코어를 둘러싸는 쉘을 포함하는 코어-쉘 염료, 이를 포함하는 감광성 수지 조성물 및 상기 감광성 수지 조성물을 이용하여 제조된 컬러필터가 제공된다.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Korean (KO)
Filing Language: Korean (KO)