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1. (WO2018043746) PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING ORGANIC ELECTROLUMINESCENT ELEMENT PARTITION WALL, PARTITION WALL, ORGANIC ELECTROLUMINESCENT ELEMENT, IMAGE DISPLAY DEVICE AND LIGHTING
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Pub. No.: WO/2018/043746 International Application No.: PCT/JP2017/031824
Publication Date: 08.03.2018 International Filing Date: 04.09.2017
IPC:
H05B 33/22 (2006.01) ,C08L 101/02 (2006.01) ,G03F 7/004 (2006.01) ,G03F 7/027 (2006.01) ,H01L 27/32 (2006.01) ,H01L 51/50 (2006.01) ,H05B 33/12 (2006.01)
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
B
ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
33
Electroluminescent light sources
12
Light sources with substantially two-dimensional radiating surfaces
22
characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
L
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
101
Compositions of unspecified macromolecular compounds
02
characterised by the presence of specified groups
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
04
Chromates
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
027
Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
27
Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
28
including components using organic materials as the active part, or using a combination of organic materials with other materials as the active part
32
with components specially adapted for light emission, e.g. flat-panel displays using organic light-emitting diodes
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
51
Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
50
specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
B
ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
33
Electroluminescent light sources
12
Light sources with substantially two-dimensional radiating surfaces
Applicants:
三菱ケミカル株式会社 MITSUBISHI CHEMICAL CORPORATION [JP/JP]; 東京都千代田区丸の内一丁目1番1号 1-1, Marunouchi 1-chome, Chiyoda-ku, Tokyo 1008251, JP
Inventors:
木村 明日香 KIMURA Asuka; JP
中谷 和裕 NAKATANI Kazuhiro; JP
土谷 達格 TSUCHIYA Tatsunori; JP
Agent:
特許業務法人栄光特許事務所 EIKOH PATENT FIRM, P.C.; 東京都港区西新橋一丁目7番13号 虎ノ門イーストビルディング10階 Toranomon East Bldg. 10F, 7-13, Nishi-Shimbashi 1-chome, Minato-ku, Tokyo 1050003, JP
Priority Data:
2016-17287505.09.2016JP
2017-02818117.02.2017JP
Title (EN) PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING ORGANIC ELECTROLUMINESCENT ELEMENT PARTITION WALL, PARTITION WALL, ORGANIC ELECTROLUMINESCENT ELEMENT, IMAGE DISPLAY DEVICE AND LIGHTING
(FR) COMPOSITION DE RÉSINE PHOTOSENSIBLE POUR FORMER UNE PAROI DE SÉPARATION D'ÉLÉMENT ÉLECTROLUMINESCENT ORGANIQUE, UNE PAROI DE SÉPARATION, UN ÉLÉMENT ÉLECTROLUMINESCENT ORGANIQUE, UN DISPOSITIF D'AFFICHAGE D'IMAGE ET UN ÉCLAIRAGE
(JA) 有機電界発光素子隔壁形成用感光性樹脂組成物、隔壁、有機電界発光素子、画像表示装置及び照明
Abstract:
(EN) The present invention addresses the problem of providing a photosensitive resin composition for forming a partition wall of an organic electroluminescent element, said partition wall having high reliability due to less outgas generation during the operation of the electroluminescent element, while having a large taper angle. A photosensitive resin composition for forming an organic electroluminescent element partition wall according to the present invention contains (A) an ethylenically unsaturated compound, (B) a photopolymerization initiator, and (C) an alkali-soluble resin; and the alkali-soluble resin (C) contains an alkali-soluble resin (c) that has a partial structure represented by general formula (1). This photosensitive resin composition for forming an organic electroluminescent element partition wall additionally contains (E) a chain transfer agent. (In formula (1), R1 represents an optionally substituted divalent hydrocarbon group having 1-4 carbon atoms; and * represents a bonding hand.)
(FR) La présente invention concerne la fourniture d'une composition de résine photosensible pour former une paroi de séparation d'un élément électroluminescent organique, ladite paroi de séparation ayant une fiabilité élevée en raison d'une génération de gaz d'échappement moins importante pendant le fonctionnement de l'élément électroluminescent, tout en ayant un grand angle de conicité. Une composition de résine photosensible pour former une paroi de séparation d'élément électroluminescent organique selon la présente invention contient (A) un composé à insaturation éthylénique, (B) un initiateur de photopolymérisation, et (C) une résine soluble dans les alcalis ; et la résine soluble dans les alcalis (C) contient une résine soluble dans les alcalis (c) dotée d'une structure partielle représentée par la formule générale (1). Cette composition de résine photosensible pour former une paroi de séparation d'élément électroluminescent organique contient en outre (E) un agent de transfert de chaîne. (Dans la formule (1), R1 désigne un groupe hydrocarboné divalent facultativement substitué ayant 1-4 atomes de carbone ; et * désigne un bras de liaison.)
(JA) 本発明の課題は、発光素子稼働時のアウトガス発生量が少なく信頼性が高く、テーパー角が大きい有機電界発光素子の隔壁を形成するための感光性樹脂組成物を提供することにある。本発明の有機電界発光素子隔壁形成用感光性樹脂組成物は、(A)エチレン性不飽和化合物、(B)光重合開始剤及び(C)アルカリ可溶性樹脂を含有し、 前記(C)アルカリ可溶性樹脂が、下記一般式(1)で表される部分構造を有するアルカリ可溶性樹脂(c)を含有し、さらに(E)連鎖移動剤を含有する。 (式(1)中、Rは置換基を有していてもよい炭素数1~4の2価の炭化水素基を表す。*は結合手を表す。)
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)