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1. (WO2018043709) ACCELERATOR, ACCELERATOR OPERATION METHOD, AND SEMICONDUCTOR PRODUCTION METHOD USING ACCELERATOR
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Pub. No.: WO/2018/043709 International Application No.: PCT/JP2017/031582
Publication Date: 08.03.2018 International Filing Date: 01.09.2017
IPC:
H05H 7/18 (2006.01) ,G03F 7/20 (2006.01) ,H05H 9/00 (2006.01) ,H05H 13/04 (2006.01)
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
H
PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY- CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
7
Details of devices of the types covered by groups H05H9/-H05H13/102
14
Vacuum chambers
18
Cavities; Resonators
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
H
PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY- CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
9
Linear accelerators
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
H
PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY- CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
13
Magnetic resonance accelerators; Cyclotrons
04
Synchrotrons
Applicants:
株式会社東芝 KABUSHIKI KAISHA TOSHIBA [JP/JP]; 東京都港区芝浦一丁目1番1号 1-1, Shibaura 1-Chome, Minato-Ku, Tokyo 1058001, JP
東芝エネルギーシステムズ株式会社 TOSHIBA ENERGY SYSTEMS & SOLUTIONS CORPORATION [JP/JP]; 神奈川県川崎市幸区堀川町72番地34 72-34, Horikawa-Cho, Saiwai-Ku, Kawasaki-Shi, Kanagawa 2120013, JP
Inventors:
川崎 泰介 KAWASAKI, Taisuke; JP
松宮 浩志 MATSUMIYA, Hiroshi; JP
宮寺 晴夫 MIYADERA, Haruo; JP
宮本 篤 MIYAMOTO, Atsushi; JP
Agent:
特許業務法人 東京国際特許事務所 TOKYO INTERNATIONAL PATENT FIRM; 東京都港区西新橋一丁目17番16号 宮田ビル2階 2nd Floor, Miyata Building, 17-16, Nishi-Shimbashi 1-Chome, Minato-Ku, Tokyo 1050003, JP
Priority Data:
2016-17145202.09.2016JP
Title (EN) ACCELERATOR, ACCELERATOR OPERATION METHOD, AND SEMICONDUCTOR PRODUCTION METHOD USING ACCELERATOR
(FR) ACCÉLÉRATEUR, PROCÉDÉ DE FONCTIONNEMENT D'ACCÉLÉRATEUR ET PROCÉDÉ DE PRODUCTION DE SEMI-CONDUCTEUR À L'AIDE D'UN ACCÉLÉRATEUR
(JA) 加速器、加速器の運転方法および加速器を用いた半導体の製造方法
Abstract:
(EN) This accelerator (1) comprises: a radio-frequency cavity (2) wherethrough a charged particle beam (B) can pass; a radio-frequency wave source (3) for sending into the radio-frequency cavity (2) an electromagnetic wave at a fundamental frequency; a laser output unit (10) delivering a laser light (L); a target part (11) irradiated by the laser light (L) to generate a charged particle; a beam extraction unit (12) accelerating the charged particles in one direction to extract the charged particle beam (B); and an output control unit (15) performing control causing the charged particle beam (B) to be emitted toward the radio-frequency cavity (2) at specific timings among the timings corresponding to the periods from the fundamental frequency.
(FR) La présente invention concerne un accélérateur (1), lequel comprend : une cavité radiofréquence (2) à travers laquelle un faisceau de particules chargées (B) peut passer ; une source d'ondes radiofréquence (3) permettant d'envoyer dans la cavité radiofréquence (2) une onde électromagnétique à une fréquence fondamentale ; une unité de sortie laser (10) fournissant une lumière laser (L) ; une partie cible (11) irradiée par la lumière laser (L) en vue de générer une particule chargée ; une unité d'extraction de faisceau (12) accélérant les particules chargées dans une direction en vue d'extraire le faisceau de particules chargées (B) ; et une unité de commande de sortie (15) effectuant une commande amenant le faisceau de particules chargées (B) à être émis vers la cavité radiofréquence (2) à des moments spécifiques parmi les moments correspondant aux périodes à partir de la fréquence fondamentale.
(JA) 加速器(1)は、荷電粒子ビーム(B)が通過可能な高周波空洞(2)と、基本周波数の電磁波を高周波空洞(2)に入力する高周波源(3)と、レーザ光(L)を出力するレーザ出力部(10)と、レーザ光(L)が照射されることで荷電粒子を発生させるターゲット部(11)と、荷電粒子を一方向に加速することで荷電粒子ビーム(B)を引き出すビーム引出部(12)と、基本周波数の周期に対応するタイミングのうちの特定のタイミングで荷電粒子ビーム(B)を高周波空洞(2)に向けて出力する制御を行う出力制御部(15)とを備える。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)