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1. (WO2018043680) NON-MAGNETIC MATERIAL-DISPERSED Fe-Pt SPUTTERING TARGET
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2018/043680 International Application No.: PCT/JP2017/031469
Publication Date: 08.03.2018 International Filing Date: 31.08.2017
IPC:
C23C 14/34 (2006.01) ,B22F 1/00 (2006.01) ,C22C 5/04 (2006.01) ,C22C 28/00 (2006.01) ,C22C 38/00 (2006.01) ,G11B 5/64 (2006.01) ,G11B 5/851 (2006.01) ,B22F 3/14 (2006.01) ,B22F 3/15 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
34
Sputtering
B PERFORMING OPERATIONS; TRANSPORTING
22
CASTING; POWDER METALLURGY
F
WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
1
Special treatment of metallic powder, e.g. to facilitate working, to improve properties; Metallic powders per se, e.g. mixtures of particles of different composition
C CHEMISTRY; METALLURGY
22
METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
C
ALLOYS
5
Alloys based on noble metals
04
Alloys based on a platinum group metal
C CHEMISTRY; METALLURGY
22
METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
C
ALLOYS
28
Alloys based on a metal not provided for in groups C22C5/-C22C27/103
C CHEMISTRY; METALLURGY
22
METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
C
ALLOYS
38
Ferrous alloys, e.g. steel alloys
G PHYSICS
11
INFORMATION STORAGE
B
INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
5
Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
62
Record carriers characterised by the selection of the material
64
comprising only the magnetic material without bonding agent
G PHYSICS
11
INFORMATION STORAGE
B
INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
5
Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
84
Processes or apparatus specially adapted for manufacturing record carriers
851
Coating a support with a magnetic layer by sputtering
B PERFORMING OPERATIONS; TRANSPORTING
22
CASTING; POWDER METALLURGY
F
WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
3
Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor
12
Both compacting and sintering
14
simultaneously
B PERFORMING OPERATIONS; TRANSPORTING
22
CASTING; POWDER METALLURGY
F
WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
3
Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor
12
Both compacting and sintering
14
simultaneously
15
Hot isostatic pressing
Applicants:
JX金属株式会社 JX NIPPON MINING & METALS CORPORATION [JP/JP]; 東京都千代田区大手町一丁目1番2号 1-2,Otemachi 1-chome,Chiyoda-ku, Tokyo 1008164, JP
Inventors:
佐藤 敦 SATO,Atsushi; JP
高見 英生 TAKAMI,Hideo; JP
中村 祐一郎 NAKAMURA,Yuichiro; JP
Agent:
アクシス国際特許業務法人 AXIS PATENT INTERNATIONAL; 東京都港区新橋二丁目6番2号 新橋アイマークビル Shimbashi i-mark Bldg., 6-2 Shimbashi 2-Chome, Minato-ku, Tokyo 1050004, JP
Priority Data:
2016-17229102.09.2016JP
Title (EN) NON-MAGNETIC MATERIAL-DISPERSED Fe-Pt SPUTTERING TARGET
(FR) CIBLE DE PULVÉRISATION À BASE DE FER/PLATINE DISPERSÉE DANS UN MATÉRIAU NON MAGNÉTIQUE
(JA) 非磁性材料分散型Fe-Pt系スパッタリングターゲット
Abstract:
(EN) Provided is a sputtering target which enables decrease in the heat treatment temperature for ordering an Fe-Pt magnetic phase, and which is suppressed in generation of particles during the sputtering. A non-magnetic material-dispersed sputtering target which contains Fe, Pt and Ge, and which has a magnetic phase satisfying a composition represented by (Fe1-αPtα)1-βGeβ (wherein α and β represent numbers satisfying 0.35 ≤ α ≤ 0.55 and 0.05 ≤ β ≤ 0.2) with respect to Fe, Pt and Ge in terms of an atomic ratio, and wherein the magnetic phase is configured such that the ratio of the average area ratio (SGe30mass%) of a Ge-based alloy phase having a Ge concentration of 30% by mass or more to the area ratio (SGe) of Ge as calculated from the overall composition of the sputtering target, namely SGe30mass%/SGe is 0.5 or less in the element mapping of a polished surface by means of EPMA if a cross-section perpendicular to the sputtering surface of the sputtering target is polished.
(FR) Cette invention concerne une cible de pulvérisation qui permet de réduire la température de traitement thermique pour commander une phase magnétique Fe-Pt, et qui est supprimée lors de la génération de particules pendant la pulvérisation. Une cible de pulvérisation dispersée dans un matériau non magnétique qui contient du Fe, du Pt et du Ge, et qui possède une phase magnétique satisfaisant une composition représentée par (Fe1-alphaPtalpha)1-bêtaGebêta (où alpha et bêta représentent des nombres satisfaisant 0,35 ≤ alpha ≤ 0,55 et 0,05 ≤ bêta ≤ 0,2) par rapport au Fe, au Pt et au Ge en termes de rapport atomique, et la phase magnétique étant configurée de telle sorte que le rapport du rapport de surface moyen (SGe30%en_masse) d'une phase d'alliage à base de Ge ayant une concentration de Ge de 30 % en masse ou plus au rapport de surface (SGe) du Ge tel que calculé à partir de la composition globale de la cible de pulvérisation, à savoir SGe30%en_masse/SGe est inférieur ou égal à 0,5 dans la cartographie d'éléments par microanalyse par électrons d'une surface polie si une section transversale perpendiculaire à la surface de pulvérisation de la cible de pulvérisation est polie.
(JA) Fe-Pt磁性相を規則化するための熱処理温度を低下させることが可能なスパッタリングターゲットであって、スパッタ時にパーティクルの発生が抑制されたスパッタリングターゲットを提供する。Fe、Pt及びGeを含有する非磁性材料分散型のスパッタリングターゲットであって、Fe、Pt及びGeについて原子数比で(Fe1-αPtα1-βGeβ(α、βは、0.35≦α≦0.55、0.05≦β≦0.2を満たす数)で表される組成を満足する磁性相を有し、該磁性相は、スパッタリングターゲットのスパッタ面に対する垂直断面を研磨したときの研磨面のEPMAによる元素マッピングにおいて、Geの濃度が30質量%以上であるGe基合金相の面積比率(SGe30質量%)の平均の、スパッタリングターゲットの全体組成から計算されるGeの面積比率(SGe)に対する割合(SGe30質量%/SGe)が、0.5以下であるスパッタリングターゲット。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)