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1. (WO2018043667) PRODUCTION METHOD FOR ACIDIC XYLOOLIGOSACCHARIDE, AND ACIDIC XYLOOLIGOSACCHARIDE
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Pub. No.: WO/2018/043667 International Application No.: PCT/JP2017/031433
Publication Date: 08.03.2018 International Filing Date: 31.08.2017
IPC:
C07H 3/06 (2006.01) ,C08B 37/00 (2006.01) ,C13K 13/00 (2006.01)
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
H
SUGARS; DERIVATIVES THEREOF; NUCLEOSIDES; NUCLEOTIDES; NUCLEIC ACIDS
3
Compounds containing only hydrogen atoms and saccharide radicals having only carbon, hydrogen, and oxygen atoms
06
Oligosaccharides, i.e. having three to five saccharide radicals attached to each other by glycosidic linkages
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
B
POLYSACCHARIDES; DERIVATIVES THEREOF
37
Preparation of polysaccharides not provided for in groups C08B1/-C08B35/110; Derivatives thereof
C CHEMISTRY; METALLURGY
13
SUGAR INDUSTRY
K
SACCHARIDES, OTHER THAN SUCROSE, OBTAINED FROM NATURAL SOURCES OR BY HYDROLYSIS OF NATURALLY OCCURRING DI-, OLIGO- OR POLYSACCHARIDES
13
Sugars not otherwise provided for in this class
Applicants:
王子ホールディングス株式会社 OJI HOLDINGS CORPORATION [JP/JP]; 東京都中央区銀座四丁目７番５号 7-5, Ginza 4-chome, Chuo-ku, Tokyo 1040061, JP
Inventors:
石川　稿太郎 ISHIKAWA Kotaro; JP
柏村　卓朗 KASHIWAMURA Takuro; JP
加藤　卓也 KATO Takuya; JP
古賀　徹 KOGA Toru; JP
石川　傑 ISHIKAWA Suguru; JP
Agent:
特許業務法人特許事務所サイクス SIKS & CO.; 東京都中央区京橋一丁目８番７号　京橋日殖ビル８階 8th Floor, Kyobashi-Nisshoku Bldg., 8-7, Kyobashi 1-chome, Chuo-ku, Tokyo 1040031, JP
Priority Data:
2016-16970931.08.2016JP (Priority Withdrawn 04.02.2019)
Title (EN) PRODUCTION METHOD FOR ACIDIC XYLOOLIGOSACCHARIDE, AND ACIDIC XYLOOLIGOSACCHARIDE
(FR) XYLOOLIGOSACCHARIDE ACIDE, ET PROCÉDÉ DE FABRICATION DE CELUI-CI
(JA) 酸性キシロオリゴ糖の製造方法及び酸性キシロオリゴ糖
Abstract:
(EN) The present invention provides a reduced-cost production method for an acidic xylooligosaccharide, the production method including a step for depolymerizing a plant-derived starting material and a deacetylation step for adding a base to a solution of the product of the depolymerization step to make the pH at least 11. The present invention also provides an acidic xylooligosaccharide that has an acetyl group content of 0-5.0 mass%. The acidic xylooligosaccharide that has an acetyl group content of 0-5.0 mass% can be used as a starting material to produce pentosan polysulfate in high yields.
(FR) L'invention fournit un procédé de fabrication à coût réduit de xylooligosaccharide acide, qui inclut une étape de dépolymérisation au cours de laquelle une matière première d'origine végétale subit une dépolymérisation, et une étape de désacétylation au cours de laquelle le pH d'une solution d'un produit obtenu à l'étape précédente, est ajusté à 11 ou plus par chauffage d'une base. L'invention fournit également un xylooligosaccharide acide de teneur en groupe acétyle comprise entre 0 et 5,0% en masse. Selon l'invention, il est possible d'obtenir avec un rendement élevé un polysulfate de pentosanne au moyen d'un procédé de fabrication prenant pour matière première le xylooligosaccharide acide de teneur en groupe acétyle comprise entre 0 et 5,0% en masse.
(JA) 本発明により、酸性キシロオリゴ糖のコストが低減された製造方法として、植物由来原料を解重合する工程、及び上記工程で得られた生成物の溶液を塩基の添加によりｐＨ１１以上とする脱アセチル化工程を含む、酸性キシロオリゴ糖の製造方法、ならびにアセチル基含量が０～５．０質量％である酸性キシロオリゴ糖が提供される。本発明のアセチル基含量が０～５．０質量％である酸性キシロオリゴ糖を原料とする製造方法によりポリ硫酸ペントサンを高収率で得ることができる。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)