WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE
Search International and National Patent Collections
World Intellectual Property Organization
Options
Query Language
Stem
Sort by:
List Length
Some content of this application is unavailable at the moment.
If this situation persist, please contact us atFeedback&Contact
1. (WO2018043582) PHOTOCURABLE SUPPORT MATERIAL COMPOSITION FOR INKJET 3D PRINTERS, INK FOR INKJET 3D PRINTERS, CARTRIDGE FOR INKJET 3D PRINTERS, METHOD FOR PRODUCING SUPPORT MATERIAL AND METHOD FOR PRODUCING OPTICALLY SHAPED ARTICLE
Latest bibliographic data on file with the International Bureau    Submit observation
Pub. No.: WO/2018/043582 International Application No.: PCT/JP2017/031210
Publication Date: 08.03.2018 International Filing Date: 30.08.2017
IPC:
B29C 64/40 (2017.01) ,B33Y 10/00 (2015.01) ,B33Y 70/00 (2015.01) ,C08F 20/06 (2006.01)
[IPC code unknown for B29C 64/40][IPC code unknown for B33Y 10][IPC code unknown for B33Y 70]
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
20
Homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide, or nitrile thereof
02
Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
04
Acids; Metal salts or ammonium salts thereof
06
Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
Applicants: NIPPON SHOKUBAI CO., LTD.[JP/JP]; 1-1, Koraibashi 4-chome, Chuo-ku, Osaka-shi, Osaka 5410043, JP
Inventors: TSUJINO Yasunori; JP
URATA Minoru; JP
MAJIMA Noriaki; JP
Agent: KAMO Midori; JP
Priority Data:
2016-17065501.09.2016JP
2017-05216717.03.2017JP
Title (EN) PHOTOCURABLE SUPPORT MATERIAL COMPOSITION FOR INKJET 3D PRINTERS, INK FOR INKJET 3D PRINTERS, CARTRIDGE FOR INKJET 3D PRINTERS, METHOD FOR PRODUCING SUPPORT MATERIAL AND METHOD FOR PRODUCING OPTICALLY SHAPED ARTICLE
(FR) COMPOSITION DE MATÉRIAU DE SUPPORT PHOTODURCISSABLE POUR IMPRIMANTES 3D À JET D'ENCRE, ENCRE POUR IMPRIMANTES 3D À JET D'ENCRE, CARTOUCHE POUR IMPRIMANTES 3D À JET D'ENCRE, PROCÉDÉ DE PRODUCTION DE MATÉRIAU DE SUPPORT ET PROCÉDÉ DE PRODUCTION D'ARTICLE DE FORME OPTIQUE
(JA) インクジェット３Ｄプリンター用光硬化性サポート材組成物、インクジェット３Ｄプリンター用インク、インクジェット３Ｄプリンター用カートリッジ、サポート材の製造方法ならびに光造形物の製造方法
Abstract:
(EN) A photocurable support material composition for inkjet 3D printers according to the present invention contains a photopolymerization initiator and a water-soluble ethylenically unsaturated monomer that contains an ionic group and a counter ion. It is preferable that the ionic group is at least one group selected from the group consisting of a carboxylic acid group, a phosphoric acid group and a sulfonic acid group. It is also preferable that the counter ion is at least one ion selected from the group consisting of a sodium ion, a potassium ion and an ammonium ion.
(FR) La présente invention concerne une composition de matériau de support photodurcissable pour imprimantes 3D à jet d'encre contenant un initiateur de photopolymérisation et un monomère éthyléniquement insaturé soluble dans l'eau qui contient un groupe ionique et un contre-ion. Il est préférable que le groupe ionique soit au moins un groupe choisi dans le groupe constitué d'un groupe acide carboxylique, d'un groupe acide phosphorique et d'un groupe acide sulfonique. Il est également préférable que le contre-ion est au moins un ion sélectionné dans le groupe constitué d'un ion de sodium, d'un ion de potassium et d'un ion d'ammonium.
(JA) 本発明に係るインクジェット３Ｄ造形用光硬化性サポート材組成物は、イオン性基と対イオンとを含有する水溶性エチレン性不飽和単量体と、光重合開始剤とを含んでいる。上記イオン性基は、カルボン酸基、リン酸基、及びスルホン酸基からなる群から選択された少なくとも１つであることが好ましい。上記対イオンは、ナトリウムイオン、カリウムイオン、及びアンモニウムイオンからなる群から選択された少なくとも１つであることが好ましい。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)