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1. (WO2018043506) RADIATION SENSITIVE COMPOSITION AND PATTERN FORMING METHOD

Pub. No.:    WO/2018/043506    International Application No.:    PCT/JP2017/031011
Publication Date: Fri Mar 09 00:59:59 CET 2018 International Filing Date: Wed Aug 30 01:59:59 CEST 2017
IPC: G03F 7/004
G03F 7/20
G03F 7/32
Applicants: JSR CORPORATION
JSR株式会社
Inventors: SHIRATANI Motohiro
白谷 宗大
Title: RADIATION SENSITIVE COMPOSITION AND PATTERN FORMING METHOD
Abstract:
The purpose of the present invention is to provide: a radiation sensitive composition that has excellent LWR performance and sensitivity; and a pattern forming method. The present invention is a radiation sensitive composition that contains particles containing a metal oxide, cations containing a metal and anions each of which is a conjugate base of an acid, and wherein the pKa of the acid is 3 or less. The content of the particles is preferably 50% by mass or more, and more preferably 70% by mass or more in terms of solid content. The hydrodynamic radius of the particles as determined by dynamic light scattering analysis is preferably 10 nm or less. The total content of the cations and the anions per 100 parts by mass of the particles is preferably 5 parts by mass or more. The acid is preferably sulfonic acid, nitric acid, an organic azine acid, a disulfonylimide acid or a combination of these acids. The metal of the cations is preferably an element of group 2, group 3, group 4, group 5, group 6, group 7, group 8, group 9, group 10, group 11, group 12 or group 13.