Some content of this application is unavailable at the moment.
If this situation persist, please contact us atFeedback&Contact
1. (WO2018043371) POLYMER COMPOUND, FILM IN WHICH THE POLYMER COMPOUND IS CURED, AND ELECTRONIC DEVICE INCLUDING THE FILM
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2018/043371 International Application No.: PCT/JP2017/030665
Publication Date: 08.03.2018 International Filing Date: 28.08.2017
IPC:
C08F 220/22 (2006.01) ,C08F 212/14 (2006.01) ,C08F 220/20 (2006.01) ,C08F 220/36 (2006.01) ,C08G 18/62 (2006.01) ,C08G 18/80 (2006.01) ,C09D 175/04 (2006.01) ,H01L 21/336 (2006.01) ,H01L 29/786 (2006.01) ,H01L 51/05 (2006.01)
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
220
Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide, or nitrile thereof
02
Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
10
Esters
22
Esters containing halogen
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
212
Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
02
Monomers containing only one unsaturated aliphatic radical
04
containing one ring
14
substituted by hetero atoms or groups containing hetero atoms
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
220
Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide, or nitrile thereof
02
Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
10
Esters
20
of polyhydric alcohols or phenols
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
220
Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide, or nitrile thereof
02
Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
10
Esters
34
Esters containing nitrogen
36
containing oxygen in addition to the carboxy oxygen
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
G
MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
18
Polymeric products of isocyanates or isothiocyanates
06
with compounds having active hydrogen
28
characterised by the compounds used containing active hydrogen
40
High-molecular-weight compounds
62
Polymers of compounds having carbon-to-carbon double bonds
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
G
MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
18
Polymeric products of isocyanates or isothiocyanates
06
with compounds having active hydrogen
70
characterised by the isocyanates or isothiocyanates used
72
Polyisocyanates or polyisothiocyanates
80
Masked polyisocyanates
C CHEMISTRY; METALLURGY
09
DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
D
COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
175
Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
04
Polyurethanes
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
04
the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer
18
the devices having semiconductor bodies comprising elements of the fourth group of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
334
Multistep processes for the manufacture of devices of the unipolar type
335
Field-effect transistors
336
with an insulated gate
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
29
Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having at least one potential-jump barrier or surface barrier; Capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof
66
Types of semiconductor device
68
controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified, or switched
76
Unipolar devices
772
Field-effect transistors
78
with field effect produced by an insulated gate
786
Thin-film transistors
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
51
Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
05
specially adapted for rectifying, amplifying, oscillating or switching and having at least one potential-jump barrier or surface barrier; Capacitors or resistors with at least one potential-jump barrier or surface barrier
Applicants:
住友化学株式会社 SUMITOMO CHEMICAL COMPANY, LIMITED [JP/JP]; 東京都中央区新川二丁目27番1号 27-1, Shinkawa 2-chome, Chuo-ku, Tokyo 1048260, JP
Inventors:
横井 優季 YOKOI, Yuki; JP
Agent:
中山 亨 NAKAYAMA, Tohru; JP
坂元 徹 SAKAMOTO, Toru; JP
Priority Data:
2016-17154502.09.2016JP
Title (EN) POLYMER COMPOUND, FILM IN WHICH THE POLYMER COMPOUND IS CURED, AND ELECTRONIC DEVICE INCLUDING THE FILM
(FR) COMPOSÉ POLYMÈRE, FILM DANS LEQUEL LE COMPOSÉ POLYMÈRE EST DURCI ET DISPOSITIF ÉLECTRONIQUE COMPRENANT LE FILM
(JA) 高分子化合物、該高分子化合物を硬化した膜及び該膜を含む電子デバイス
Abstract:
(EN) A polymer compound including repeating units having at least one group selected from the group consisting of blocked isocyanato groups and blocked isothiocyanato groups, a repeating unit having at least one group selected from the group consisting of hydroxy groups and carboxy groups, and a repeating unit represented by formula (1), wherein, assuming the total amount of all repeating units included in the polymer compound is 100 mol%, the amount of repeating units having at least one group selected from the group consisting of blocked isocyanato groups and blocked isothiocyanato groups in the polymer is 1 to 30 mol%. (In formula (1), R1, R2, and R3 each independently represent a hydrogen atom or a methyl group).
(FR) L'invention concerne un composé polymère comprenant des motifs récurrents présentant au moins un groupe choisi dans le groupe constitué par les groupes isocyanato bloqués et les groupes isothiocyanato bloqués, un motif récurrent présentant au moins un groupe choisi dans le groupe constitué par les groupes hydroxy et les groupes carboxy et un motif récurrent représenté par la formule (1), où, en supposant que la quantité totale de tous les motifs récurrents compris dans le composé polymère est de 100 % en mole, la quantité de motifs récurrents présentant au moins un groupe choisi dans le groupe constitué par les groupes isocyanato bloqués et les groupes isothiocyanato bloqués dans le polymère est de 1 à 30 % en mole. (Dans la formule (1), R1, R2 et R3 représentent, chacun indépendamment, un atome d'hydrogène ou un groupe méthyle).
(JA) ブロック化イソシアナト基及びブロック化イソチオシアナト基からなる群から選ばれる少なくとも1種の基を有する繰り返し単位と、 ヒドロキシ基及びカルボキシ基からなる群から選ばれる少なくとも1種の基を有する繰り返し単位と、 下記式(1)で表される繰り返し単位と を含む高分子化合物であって、 前記高分子化合物に含まれる全ての繰り返し単位の合計含有量を100mol%として、 高分子化合物中のブロック化イソシアナト基及びブロック化イソチオシアナト基からなる群から選ばれる少なくとも1種の基を有する繰り返し単位の含有量が1モル%以上30モル%以下である高分子化合物。(式(1)中、R、R及びRは、それぞれ独立に、水素原子、又はメチル基を表す。) 
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)