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1. (WO2018043347) PELLICLE PRODUCTION METHOD
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.:    WO/2018/043347    International Application No.:    PCT/JP2017/030578
Publication Date: 08.03.2018 International Filing Date: 25.08.2017
IPC:
G03F 1/62 (2012.01), C30B 25/02 (2006.01), C30B 29/36 (2006.01), H01L 21/306 (2006.01)
Applicants: AIR WATER INC. [JP/JP]; 2, Kita 3-jo Nishi 1-chome, Chuo-ku, Sapporo-shi Hokkaido 0600003 (JP)
Inventors: OKU, Hidehiko; (JP).
HIDE, Ichiro; (JP)
Agent: TSUBAKI, Yutaka; (JP)
Priority Data:
2016-167257 29.08.2016 JP
Title (EN) PELLICLE PRODUCTION METHOD
(FR) PROCÉDÉ DE PRODUCTION DE PELLICULE
(JA) ペリクルの製造方法
Abstract: front page image
(EN)Provided is a pellicle production method which allows for the simplification of production steps. The pellicle production method comprises: a step for forming an SiC film (11) on a lower surface (21a) of an Si substrate (21); a step for bonding a support body (12), which includes a through hole, to a lower surface (11a) of the SiC film; and a step for removing the Si substrate after the step for bonding the support body.
(FR)L'invention concerne un procédé de production de pellicule qui permet la simplification des étapes de production. Le procédé de production de pellicule comprend : une étape de formation d'un film de SiC (11) sur une surface inférieure (21a) d'un substrat de Si (21) ; une étape de liaison d'un corps de support (12), qui comprend un trou traversant, à une surface inférieure (11a) du film de SiC ; et une étape de retrait du substrat de Si après l'étape de liaison du corps de support.
(JA)製造工程の簡素化を図ることのできるペリクルの製造方法を提供する。ペリクルの製造方法は、Si基板(21)の下面(21a)にSiC膜(11)を形成する工程と、前記SiC膜の下面(11a)に貫通孔を含む支持体(12)を接着する工程と、前記支持体を接着する工程の後で、前記Si基板を除去する工程とを備える。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)