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Pub. No.:    WO/2018/043347    International Application No.:    PCT/JP2017/030578
Publication Date: 08.03.2018 International Filing Date: 25.08.2017
G03F 1/62 (2012.01), C30B 25/02 (2006.01), C30B 29/36 (2006.01), H01L 21/306 (2006.01)
Applicants: AIR WATER INC. [JP/JP]; 2, Kita 3-jo Nishi 1-chome, Chuo-ku, Sapporo-shi Hokkaido 0600003 (JP)
Inventors: OKU, Hidehiko; (JP).
HIDE, Ichiro; (JP)
Agent: TSUBAKI, Yutaka; (JP)
Priority Data:
2016-167257 29.08.2016 JP
(JA) ペリクルの製造方法
Abstract: front page image
(EN)Provided is a pellicle production method which allows for the simplification of production steps. The pellicle production method comprises: a step for forming an SiC film (11) on a lower surface (21a) of an Si substrate (21); a step for bonding a support body (12), which includes a through hole, to a lower surface (11a) of the SiC film; and a step for removing the Si substrate after the step for bonding the support body.
(FR)L'invention concerne un procédé de production de pellicule qui permet la simplification des étapes de production. Le procédé de production de pellicule comprend : une étape de formation d'un film de SiC (11) sur une surface inférieure (21a) d'un substrat de Si (21) ; une étape de liaison d'un corps de support (12), qui comprend un trou traversant, à une surface inférieure (11a) du film de SiC ; et une étape de retrait du substrat de Si après l'étape de liaison du corps de support.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)