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1. (WO2018043323) NOVEL GARNET COMPOUND, SINTERED BODY CONTAINING SAME, AND SPUTTERING TARGET
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Pub. No.: WO/2018/043323 International Application No.: PCT/JP2017/030508
Publication Date: 08.03.2018 International Filing Date: 25.08.2017
IPC:
C01G 15/00 (2006.01) ,C04B 35/01 (2006.01) ,C04B 35/50 (2006.01) ,C23C 14/34 (2006.01)
C CHEMISTRY; METALLURGY
01
INORGANIC CHEMISTRY
G
COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F94
15
Compounds of gallium, indium, or thallium
C CHEMISTRY; METALLURGY
04
CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
B
LIME; MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
35
Shaped ceramic products characterised by their composition; Ceramic compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
01
based on oxides
C CHEMISTRY; METALLURGY
04
CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
B
LIME; MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
35
Shaped ceramic products characterised by their composition; Ceramic compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
50
based on rare earth compounds
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
34
Sputtering
Applicants:
出光興産株式会社 IDEMITSU KOSAN CO.,LTD. [JP/JP]; 東京都千代田区丸の内三丁目1番1号 1-1, Marunouchi 3-chome, Chiyoda-ku, Tokyo 1008321, JP
Inventors:
井上 一吉 INOUE, Kazuyoshi; JP
笘井 重和 TOMAI, Shigekazu; JP
柴田 雅敏 SHIBATA, Masatoshi; JP
Agent:
特許業務法人平和国際特許事務所 HEIWA INTERNATIONAL PATENT OFFICE; 東京都千代田区神田須田町一丁目26番地 芝信神田ビル3階 Shibashin Kanda Bldg. 3rd Floor, 26, Kanda Suda-cho 1-chome, Chiyoda-ku, Tokyo 1010041, JP
Priority Data:
2016-16942731.08.2016JP
2016-19625704.10.2016JP
Title (EN) NOVEL GARNET COMPOUND, SINTERED BODY CONTAINING SAME, AND SPUTTERING TARGET
(FR) NOUVEAU COMPOSÉ DE GRENAT, CORPS FRITTÉ LE CONTENANT, ET CIBLE DE PULVÉRISATION
(JA) 新規ガーネット化合物、それを含有する焼結体及びスパッタリングターゲット
Abstract:
(EN) A garnet compound represented by general formula (I) Ln3In2Ga3-XAlXO12. (In the formula, Ln represents one or more metal elements selected from among La, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb and Lu; and X satisfies 0 ≤ X < 3.)
(FR) L'invention concerne un composé de grenat représenté par la formule générale (I) Ln3In2Ga3-XAlXO12. (Dans La formule, Ln représente un ou plusieurs éléments métalliques choisis parmi La, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb et Lu; et X satisfait 0 ≤ X < 3.)
(JA) 一般式(I): LnInGa3-XAl12 (I)(式中、Lnは、La、Nd、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、Yb及びLuから選ばれた一種以上の金属元素を表す。Xは、0≦X<3である。)で表されるガーネット化合物。
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)