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1. (WO2018043257) EXPOSURE DEVICE AND EXPOSURE METHOD
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Pub. No.: WO/2018/043257 International Application No.: PCT/JP2017/030184
Publication Date: 08.03.2018 International Filing Date: 23.08.2017
IPC:
G03F 7/22 (2006.01) ,G03F 7/20 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
22
Exposing sequentially with the same light pattern different positions of the same surface
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
Applicants: V TECHNOLOGY CO., LTD.[JP/JP]; 134, Godo-cho, Hodogaya-ku, Yokohama-shi, Kanagawa 2400005, JP
Inventors: TOGASHI Takumi; JP
HARADA Tomonori; JP
NAGAI Kazuma; JP
Agent: EIKOH PATENT FIRM, P.C.; Toranomon East Bldg. 10F, 7-13, Nishi-Shimbashi 1-chome, Minato-ku, Tokyo 1050003, JP
Priority Data:
2016-16719329.08.2016JP
Title (EN) EXPOSURE DEVICE AND EXPOSURE METHOD
(FR) DISPOSITIF D'EXPOSITION ET PROCÉDÉ D'EXPOSITION
(JA) 露光装置及び露光方法
Abstract:
(EN) This exposure device is provided with: a substrate holding unit (2) that holds a substrate (W) having a plurality of exposure regions (E1-E6); a mask holding unit (1) that holds a mask (M), on which a pattern having a size substantially equal to that of an exposure region (E) is formed; a substrate transfer unit (10) capable of transferring the substrate (W) in the predetermined direction; a mask transfer unit (40) capable of transferring the mask (M) in the predetermined direction; a mask drive unit (50) capable of adjusting alignment between the substrate (W) and the mask (M); and an illuminating device (3) that irradiates the exposure region (E) with exposure light via the mask (M).
(FR) L'invention concerne un dispositif d'exposition comprenant : une unité de maintien de substrat (2) qui maintient un substrat (W) comportant une pluralité de régions d'exposition (E1 à E6) ; une unité de maintien de masque (1) qui maintient un masque (M), sur lequel est formé un motif ayant une taille sensiblement égale à celle d'une région d'exposition (E) ; une unité de transfert de substrat (10) apte à transférer le substrat (W) dans la direction prédéterminée ; une unité de transfert de masque (40) apte à transférer le masque (M) dans la direction prédéterminée ; une unité d'entraînement de masque (50) apte à ajuster l'alignement entre le substrat (W) et le masque (M) ; et un dispositif d'éclairage (3) qui expose la région d'exposition (E) à une lumière d'exposition par l'intermédiaire du masque (M).
(JA) 露光装置は、複数の露光領域(E1)~(E6)を有する基板(W)を保持する基板保持部(2)と、露光領域(E)と略等しい大きさを有するパターンが形成されたマスク(M)を保持するマスク保持部(1)と、基板(W)を所定の方向に搬送可能な基板搬送部(10)と、マスク(M)を所定の方向に搬送可能なマスク搬送部(40)と、基板(W)とマスク(M)とのアライメントを調整可能なマスク駆動部(50)と、マスク(M)を介して露光領域(E)に露光光を照射する照明装置(3)と、を備える。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)