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1. (WO2018043255) ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND ELECTRONIC DEVICE PRODUCTION METHOD
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Pub. No.: WO/2018/043255 International Application No.: PCT/JP2017/030178
Publication Date: 08.03.2018 International Filing Date: 23.08.2017
IPC:
G03F 7/038 (2006.01) ,G03F 7/039 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
038
Macromolecular compounds which are rendered insoluble or differentially wettable
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
039
Macromolecular compounds which are photodegradable, e.g. positive electron resists
Applicants:
富士フイルム株式会社 FUJIFILM CORPORATION [JP/JP]; 東京都港区西麻布2丁目26番30号 26-30, NISHIAZABU 2-chome, MINATO-KU, Tokyo 1068620, JP
Inventors:
二橋 亘 NIHASHI, Wataru; JP
古谷 創 FURUTANI, Hajime; JP
金子 明弘 KANEKO, Akihiro; JP
椿 英明 TSUBAKI, Hideaki; JP
平野 修史 HIRANO, Shuji; JP
Agent:
蔵田 昌俊 KURATA, Masatoshi; JP
野河 信久 NOGAWA, Nobuhisa; JP
河野 直樹 KOHNO, Naoki; JP
井上 正 INOUE, Tadashi; JP
Priority Data:
2016-16938531.08.2016JP
Title (EN) ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND ELECTRONIC DEVICE PRODUCTION METHOD
(FR) COMPOSITION DE RÉSINE SENSIBLE AUX RAYONS ACTIFS OU SENSIBLE AUX RAYONNEMENTS, PROCÉDÉ DE FORMATION DE MOTIF ET PROCÉDÉ DE PRODUCTION DE DISPOSITIF ÉLECTRONIQUE
(JA) 感活性光線性又は感放射線性樹脂組成物、パターン形成方法及び電子デバイスの製造方法
Abstract:
(EN) The present invention provides an active ray-sensitive or radiation-sensitive resin composition that comprises a resin and a compound capable of generating an acid upon irradiation with an active ray or radiation. The resin contains a repeating unit (a) represented by general formula (I-1) and a repeating unit (b) capable of forming a polar group as a result of desorption of a protecting group including a single ring by the action of an acid. (In the formula, R11 and R12 each independently represent a hydrogen atom or an alkyl group. R13 represents a hydrogen atom or an alkyl group, or a single bond or an alkylene group, and forms a ring by binding with L or Ar in the formula. L represents a single bond or a divalent linking group. Ar represents an aromatic ring. "n" represents an integer of 2 or more.)
(FR) La présente invention concerne une composition de résine sensible aux rayons actifs ou sensible aux rayonnements qui comprend une résine et un composé capable de générer un acide lors de l'irradiation avec un rayon ou un rayonnement actif. La résine contient une unité de répétition (a) représentée par la formule générale (I-1) et une unité de répétition (b) capable de former un groupe polaire suite à la désorption d'un groupe de protection contenant un cycle unique par l'action d'un acide. (Dans la formule, R11 et R12 représentent chacun indépendamment un atome d'hydrogène et un groupe alkyle. R13 représente un atome d'hydrogène ou un groupe alkyle, ou une liaison simple ou un groupe alkylène, et forme un cycle par liaison avec L ou Ar dans la formule. L représente une liaison simple ou un groupe de liaison divalent. Ar représente un cycle aromatique. « n » représente un nombre entier égal ou supérieur à 2.)
(JA) 樹脂と、活性光線又は放射線の照射により酸を発生する化合物とを含有する感活性光線性又は感放射線性樹脂組成物が提供される。上記樹脂は、下記一般式(I-1)により表される繰り返し単位(a)と、酸の作用により単環を含む保護基が脱離して極性基を生じる基を有する繰り返し単位(b)を含む。(式中、R11及びR12は、各々独立に、水素原子又はアルキル基を表す。R13は、水素原子又はアルキル基を表すか、もしくは、単結合又はアルキレン基であり、且つ、式中のL又はArに結合して環を形成している。Lは、単結合又は2価の連結基を表す。Arは、芳香環を表す。nは、2以上の整数を表す。)
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)