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1. (WO2018043218) PHOTOSENSITIVE COMPOSITION, CURED FILM, OPTICAL FILTER, LAMINATED BODY, PATTERN FORMATION METHOD, SOLID-STATE IMAGING ELEMENT, IMAGE DISPLAY DEVICE, AND INFRARED SENSOR
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Pub. No.: WO/2018/043218 International Application No.: PCT/JP2017/030001
Publication Date: 08.03.2018 International Filing Date: 23.08.2017
IPC:
G03F 7/004 (2006.01) ,G02B 5/22 (2006.01) ,G03F 7/027 (2006.01) ,G03F 7/038 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
04
Chromates
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5
Optical elements other than lenses
20
Filters
22
Absorbing filters
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
027
Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
038
Macromolecular compounds which are rendered insoluble or differentially wettable
Applicants:
富士フイルム株式会社 FUJIFILM CORPORATION [JP/JP]; 東京都港区西麻布2丁目26番30号 26-30, Nishiazabu 2-chome, Minato-ku, Tokyo 1068620, JP
Inventors:
宮田 哲志 MIYATA Tetsushi; JP
高橋 和敬 TAKAHASHI Kazutaka; JP
大河原 昂広 OKAWARA Takahiro; JP
Agent:
特許業務法人特許事務所サイクス SIKS & CO.; 東京都中央区京橋一丁目8番7号 京橋日殖ビル8階 8th Floor, Kyobashi-Nisshoku Bldg., 8-7, Kyobashi 1-chome, Chuo-ku, Tokyo 1040031, JP
Priority Data:
2016-16794530.08.2016JP
Title (EN) PHOTOSENSITIVE COMPOSITION, CURED FILM, OPTICAL FILTER, LAMINATED BODY, PATTERN FORMATION METHOD, SOLID-STATE IMAGING ELEMENT, IMAGE DISPLAY DEVICE, AND INFRARED SENSOR
(FR) COMPOSITION PHOTOSENSIBLE, FILM DURCI, FILTRE OPTIQUE, CORPS STRATIFIÉ, PROCÉDÉ DE FORMATION DE MOTIF, ÉLÉMENT D'IMAGERIE À SEMI-CONDUCTEURS, DISPOSITIF D'AFFICHAGE D'IMAGE ET CAPTEUR INFRAROUGE
(JA) 感光性組成物、硬化膜、光学フィルタ、積層体、パターン形成方法、固体撮像素子、画像表示装置および赤外線センサ
Abstract:
(EN) The present invention provides a photosensitive composition that enables forming a cured film having a pattern in which heat shrinkage is inhibited and which is of preferable rectangularity. Also provided are a cured film, an optical filter, a laminated body, a pattern formation method, a solid-state imaging element, an image display device, and an infrared sensor that all use said photosensitive composition. This photosensitive composition comprises a near-infrared absorbent, a curable compound, a photo initiator, and an ultraviolet absorbent, wherein the ultraviolet absorbent shows a mass reduction rate of at most 5% at 150°C and a mass reduction rate of at least 40% at 220°C, as measured by thermogravimetry.
(FR) La présente invention concerne une composition photosensible qui permet de former un film durci ayant un motif dans lequel un retrait thermique est empêché et dont la rectangularité est préférable. L'invention concerne également un film durci, un filtre optique, un corps stratifié, un procédé de formation de motif, un élément d'imagerie à semi-conducteurs, un dispositif d'affichage d'image et un capteur infrarouge qui utilisent tous ladite composition photosensible. Cette composition photosensible comprend un absorbant dans l'infrarouge proche, un composé durcissable, un photo-initiateur et un absorbant d'ultraviolets, l'absorbant d'ultraviolets présentant un taux de réduction de masse d'au plus 5 % à 150 °C et un taux de réduction de masse d'au moins 40 % à 220 °C, tel que mesuré par thermogravimétrie.
(JA) 矩形性が良好で、加熱収縮の抑制されたパターンを有する硬化膜を形成できる感光性組成物を提供する。また、前述の感光性組成物を用いた硬化膜、光学フィルタ、積層体、パターン形成方法、固体撮像素子、画像表示装置および赤外線センサを提供する。この感光性組成物は、近赤外線吸収剤と、硬化性化合物と、光開始剤と、紫外線吸収剤とを含み、紫外線吸収剤は、熱重量測定において、150℃における質量減少率が5%以下であり、かつ、220℃における質量減少率が40%以上である。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)