Search International and National Patent Collections

1. (WO2018043166) PROCESSES FOR PRODUCING FLUOROETHER COMPOUNDS

Pub. No.:    WO/2018/043166    International Application No.:    PCT/JP2017/029686
Publication Date: Fri Mar 09 00:59:59 CET 2018 International Filing Date: Sat Aug 19 01:59:59 CEST 2017
IPC: C08G 65/337
Applicants: AGC INC.
AGC株式会社
Inventors: HOSHINO Taiki
星野 泰輝
AOYAMA Motoshi
青山 元志
TAKAO Kiyotaka
高尾 清貴
Title: PROCESSES FOR PRODUCING FLUOROETHER COMPOUNDS
Abstract:
Processes for producing fluoroether compounds are provided by which fluoroether compounds capable of imparting excellent water and oil repellency, etc. to a surface of a base or to a hardcoat layer can be easily produced in high yield. One of the processes comprises reacting Rf(CF2)a-CF2OC(=O)Rf4 or Rf(CF2)a-C(=O)X1 with HN(-R1CH=CH2)2 to produce Rf(CF2)a-C(=O)N(-R1CH=CH2)2 as a desired substance. Another process comprises obtaining the desired substance and reacting the substance with HSiR2nL3-n to produce Rf(CF2)a-C(=O)N(-R1CH2CH2SiR2nL3-n)2. Rf is a linear, C2 or higher polyfluoroalkyl group having one or more etheric oxygen atoms between carbon atoms; Rf4 is a C1-30 perfluoroalkyl group, etc.; X1 is a halogen atom; R1 is an alkylene group; a is an integer of 1-5; R2 is a monovalent hydrocarbon group; L is a hydrolyzable group; and n is an integer of 0-2.