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1. (WO2018043046) SUBSTRATE WITH FUNCTIONAL FINE LINE AND METHOD FOR FORMING FUNCTIONAL FINE LINE

Pub. No.:    WO/2018/043046    International Application No.:    PCT/JP2017/028604
Publication Date: Fri Mar 09 00:59:59 CET 2018 International Filing Date: Tue Aug 08 01:59:59 CEST 2017
IPC: B32B 3/14
B32B 27/36
H01B 5/14
H01B 13/00
H01L 51/50
H05B 33/02
H05B 33/10
H05B 33/22
H05B 33/26
H05B 33/28
H05K 3/24
Applicants: KONICA MINOLTA, INC.
コニカミノルタ株式会社
Inventors: YAMAUCHI Masayoshi
山内 正好
OHYA Hidenobu
大屋 秀信
OMATA Takenori
小俣 猛憲
NIIZUMA Naoto
新妻 直人
Title: SUBSTRATE WITH FUNCTIONAL FINE LINE AND METHOD FOR FORMING FUNCTIONAL FINE LINE
Abstract:
Provided are a substrate with a functional fine line, and a method for forming a functional fine line, in which the adhesion of the functional fine line is excellent in optical properties. The substrate with a functional fine line according to the present invention has, on a substrate, an undercoat layer comprising a hydrophobically modified polyester resin, and has, on the undercoat layer, a functional fine line comprising a deposit of functional microparticles and having a line width of 1-10 μm. In the method for forming a functional fine line according to the present invention, an undercoat layer comprising a hydrophobically modified polyester resin is formed on a substrate, and a functional fine line comprising a deposit of functional microparticles and having a line width of 1-10 μm is next formed on the undercoat layer.