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1. (WO2018043041) MANUFACTURING METHOD FOR DIELECTRIC MULTILAYER FILM-EQUIPPED GLASS PLATE, AND DIELECTRIC MULTILAYER FILM-EQUIPPED GLASS PLATE

Pub. No.:    WO/2018/043041    International Application No.:    PCT/JP2017/028528
Publication Date: Fri Mar 09 00:59:59 CET 2018 International Filing Date: Tue Aug 08 01:59:59 CEST 2017
IPC: C03C 17/34
B32B 9/00
C23C 14/08
G02B 1/115
G02B 5/26
G02B 5/28
Applicants: NIPPON ELECTRIC GLASS CO., LTD.
日本電気硝子株式会社
Inventors: SAHARA, Keiichi
佐原 啓一
IMAMURA, Tsutomu
今村 努
TANABE, Yasutaka
田邉 泰崇
Title: MANUFACTURING METHOD FOR DIELECTRIC MULTILAYER FILM-EQUIPPED GLASS PLATE, AND DIELECTRIC MULTILAYER FILM-EQUIPPED GLASS PLATE
Abstract:
The purpose of the present invention is to provide a manufacturing method for a dielectric multilayer film-equipped glass plate having excellent scratch resistance. Provided is a manufacturing method for a dielectric multilayer film-equipped glass plate 1 comprising a glass plate 2 and a dielectric multilayer film 3 laminated on the glass plate 2. The dielectric multilayer film 3 has a first film 4 made of silicon oxide and a second film 5 made of a material with a higher refractive index than silicon oxide. The manufacturing method is characterized by comprising a step for preparing the glass plate 2, and a step for depositing the dielectric multilayer film 3 on the glass plate 2 by sputtering, and is characterized in that, when depositing the first film 4 by sputtering, the deposition pressure for the first film 4 is 0.4Pa or lower.