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|1. (WO2018043041) MANUFACTURING METHOD FOR DIELECTRIC MULTILAYER FILM-EQUIPPED GLASS PLATE, AND DIELECTRIC MULTILAYER FILM-EQUIPPED GLASS PLATE|
|Applicants:||NIPPON ELECTRIC GLASS CO., LTD.
|Title:||MANUFACTURING METHOD FOR DIELECTRIC MULTILAYER FILM-EQUIPPED GLASS PLATE, AND DIELECTRIC MULTILAYER FILM-EQUIPPED GLASS PLATE|
The purpose of the present invention is to provide a manufacturing method for a dielectric multilayer film-equipped glass plate having excellent scratch resistance. Provided is a manufacturing method for a dielectric multilayer film-equipped glass plate 1 comprising a glass plate 2 and a dielectric multilayer film 3 laminated on the glass plate 2. The dielectric multilayer film 3 has a first film 4 made of silicon oxide and a second film 5 made of a material with a higher refractive index than silicon oxide. The manufacturing method is characterized by comprising a step for preparing the glass plate 2, and a step for depositing the dielectric multilayer film 3 on the glass plate 2 by sputtering, and is characterized in that, when depositing the first film 4 by sputtering, the deposition pressure for the first film 4 is 0.4Pa or lower.