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1. (WO2018042897) STAGE DEVICE AND CHARGED PARTICLE BEAM DEVICE
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Pub. No.: WO/2018/042897 International Application No.: PCT/JP2017/025365
Publication Date: 08.03.2018 International Filing Date: 12.07.2017
IPC:
H01J 37/20 (2006.01) ,B23Q 1/72 (2006.01) ,G12B 5/00 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02
Details
20
Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
B PERFORMING OPERATIONS; TRANSPORTING
23
MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
Q
DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL, CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
1
Members which are comprised in the general build-up of a form of machine, particularly relatively large fixed members
72
Auxiliary arrangements; Interconnections between auxiliary tables and movable machine elements
G PHYSICS
12
INSTRUMENT DETAILS
B
CONSTRUCTIONAL DETAILS OF INSTRUMENTS, OR COMPARABLE DETAILS OF OTHER APPARATUS, NOT OTHERWISE PROVIDED FOR
5
Adjusting position or attitude, e.g. level, of instruments or other apparatus, or of parts thereof; Compensating for the effects of tilting or acceleration, e.g. for optical apparatus
Applicants:
株式会社日立ハイテクノロジーズ HITACHI HIGH-TECHNOLOGIES CORPORATION [JP/JP]; 東京都港区西新橋一丁目24番14号 24-14, Nishi Shimbashi 1-chome, Minato-ku, Tokyo 1058717, JP
Inventors:
高橋 宗大 TAKAHASHI Motohiro; JP
水落 真樹 MIZUOCHI Masaki; JP
中川 周一 NAKAGAWA Shuichi; JP
小川 博紀 OGAWA Hironori; JP
加藤 孝宜 KATO Takanori; JP
Agent:
ポレール特許業務法人 POLAIRE I.P.C.; 東京都中央区日本橋茅場町二丁目13番11号 13-11, Nihonbashikayabacho 2-chome, Chuo-ku, Tokyo 1030025, JP
Priority Data:
2016-16747630.08.2016JP
Title (EN) STAGE DEVICE AND CHARGED PARTICLE BEAM DEVICE
(FR) DISPOSITIF À ÉTAGE ET DISPOSITIF DE FAISCEAU DE PARTICULES CHARGÉES
(JA) ステージ装置、及び荷電粒子線装置
Abstract:
(EN) The present invention relates to a charged particle beam device wherein a table deformation arising from the movement of a rolling element from a guide can be suppressed via a simple constitution. Provided in the sample stage containing a table (105) and a linear guide, which comprises a carriage (201), a rolling element, and a guide rail (202), is a distortion-insulating guide structure characterized by the connection between the carriage (201) and the table (105) being mediated by an adapter (401) that is an elastic deformable member. The invention also provides a stage using the guide structure and a charged particle beam device using the stage.
(FR) La présente invention concerne un dispositif à faisceau de particules chargées dans lequel une déformation de table résultant du mouvement d'un élément roulant à partir d'un guide peut être supprimée par l'intermédiaire d'une constitution simple. Dans l'étage d'échantillon contenant une table (105) et un guide linéaire, qui comprend un chariot (201), un élément roulant et un rail de guidage (202), se trouve une structure de guidage d'isolation de distorsion caractérisée par le fait que la liaison entre le chariot (201) et la table (105) est médiée par un adaptateur (401) qui est un élément déformable élastique. L'invention concerne également un étage utilisant la structure de guidage et un dispositif de faisceau de particules chargées utilisant l'étage.
(JA) 本発明は、簡易な構成でガイドの転動体の移動に起因するテーブル変形を抑制することのできる荷電粒子線装置に関するものであって、キャリッジ(201)と転動体とガイドレール(202)を有するリニアガイドと、テーブル(105)を有する試料ステージにおいて、キャリッジ(201)とテーブル(105)の間を弾性変形可能な部材であるアダプタ(401)を介して接続することを特徴とする歪み絶縁ガイド構造、および前記ガイド構造を用いたステージ、および前記ステージを用いた荷電粒子線装置を提案する。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)