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1. (WO2018042892) ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
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Pub. No.: WO/2018/042892 International Application No.: PCT/JP2017/025277
Publication Date: 08.03.2018 International Filing Date: 11.07.2017
IPC:
G03F 7/039 (2006.01) ,C08F 220/28 (2006.01) ,G03F 7/20 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
039
Macromolecular compounds which are photodegradable, e.g. positive electron resists
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
220
Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide, or nitrile thereof
02
Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
10
Esters
26
Esters containing oxygen in addition to the carboxy oxygen
28
containing no aromatic rings in the alcohol moiety
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
Applicants:
富士フイルム株式会社 FUJIFILM CORPORATION [JP/JP]; 東京都港区西麻布2丁目26番30号 26-30, Nishiazabu 2-chome, Minato-ku, Tokyo 1068620, JP
Inventors:
畠山 直也 HATAKEYAMA Naoya; JP
米久田 康智 YONEKUTA Yasunori; JP
福原 敏明 FUKUHARA Toshiaki; JP
冨賀 敬充 TOMIGA Takamitsu; JP
吉野 文博 YOSHINO Fumihiro; JP
Agent:
中島 順子 NAKASHIMA Junko; JP
米倉 潤造 YONEKURA Junzo; JP
村上 泰規 MURAKAMI Yasunori; JP
Priority Data:
2016-16831630.08.2016JP
2016-25013022.12.2016JP
Title (EN) ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
(FR) COMPOSITION DE RÉSINE SENSIBLE À LA LUMIÈRE ACTIVE OU SENSIBLE AU RAYONNEMENT, FILM SENSIBLE À LA LUMIÈRE ACTIVE OU SENSIBLE AU RAYONNEMENT, PROCÉDÉ DE FORMATION DE MOTIF ET PROCÉDÉ DE FABRICATION DE DISPOSITIF ÉLECTRONIQUE
(JA) 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、パターン形成方法、及び、電子デバイスの製造方法
Abstract:
(EN) Provided are: an active light sensitive or radiation sensitive resin composition which enables accurate performance evaluation of a resist pattern obtained from a thick resist film; an active light sensitive or radiation sensitive film; a pattern forming method; and a method for manufacturing an electronic device. This active light sensitive or radiation sensitive resin composition contains a resin that has a repeating unit having an alkyleneoxy chain and a repeating unit having an aromatic group, and has a solid content concentration of 10% by mass or more. This pattern forming method has (i) a step for forming an active light sensitive or radiation sensitive film having a film thickness of 1 μm or more on a substrate with use of an active light sensitive or radiation sensitive resin composition which contains a resin that has a repeating unit having an alkyleneoxy chain.
(FR) L'invention concerne : une composition de résine sensible à la lumière active ou sensible au rayonnement qui permet une évaluation de performance précise d'un motif de réserve obtenu à partir d'un film de réserve épais ; un film sensible à la lumière active ou sensible au rayonnement ; un procédé de formation de motif ; et un procédé de fabrication d'un dispositif électronique. Cette composition de résine sensible à la lumière active ou sensible au rayonnement contient une résine qui contient une unité de répétition ayant une chaîne alkylèneoxy et une unité de répétition ayant un groupe aromatique, et qui a une concentration de contenu solide de 10 % en masse ou plus. Ce procédé de formation de motif a (i) une étape de formation d'un film sensible à la lumière active ou sensible au rayonnement ayant une épaisseur de film de 1 µm ou plus sur un substrat à l'aide d'une composition de résine sensible à la lumière active ou sensible au rayonnement qui contient une résine qui contient une unité de répétition ayant une chaîne alkylèneoxy.
(JA) 厚膜のレジスト膜から得られたレジストパターンの性能評価を正確に実施可能な感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、パターン形成方法、及び、電子デバイスの製造方法を提供する。感活性光線性又は感放射線性樹脂組成物は、アルキレンオキシ鎖を有する繰り返し単位と、芳香族基を有する繰り返し単位とを有する樹脂を含有し、固形分濃度が10質量%以上である。パターン形成方法は、(i)アルキレンオキシ鎖を有する繰り返し単位を有する樹脂を含有する感活性光線性又は感放射線性樹脂組成物によって基板上に膜厚が1μm以上の感活性光線性又は感放射線性膜を形成する工程を有する。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)