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1. (WO2018042833) PHOTOSENSITIVE RESIN COMPOSITION, TRANSFER FILM, PROTECTIVE FILM FOR TOUCH PANELS, TOUCH PANEL, METHOD FOR PRODUCING TOUCH PANEL, AND IMAGE DISPLAY DEVICE
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Pub. No.: WO/2018/042833 International Application No.: PCT/JP2017/022523
Publication Date: 08.03.2018 International Filing Date: 19.06.2017
IPC:
G03F 7/033 (2006.01) ,G03F 7/004 (2006.01) ,G06F 3/041 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
027
Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
032
with binders
033
the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
04
Chromates
G PHYSICS
06
COMPUTING; CALCULATING; COUNTING
F
ELECTRIC DIGITAL DATA PROCESSING
3
Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
01
Input arrangements or combined input and output arrangements for interaction between user and computer
03
Arrangements for converting the position or the displacement of a member into a coded form
041
Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
Applicants:
富士フイルム株式会社 FUJIFILM CORPORATION [JP/JP]; 東京都港区西麻布2丁目26番30号 26-30, Nishiazabu 2-chome, Minato-ku, Tokyo 1068620, JP
Inventors:
霜山 達也 SHIMOYAMA, Tatsuya; JP
中村 秀之 NAKAMURA, Hideyuki; JP
Agent:
特許業務法人太陽国際特許事務所 TAIYO, NAKAJIMA & KATO; 東京都新宿区新宿4丁目3番17号 3-17, Shinjuku 4-chome, Shinjuku-ku, Tokyo 1600022, JP
Priority Data:
2016-16842530.08.2016JP
Title (EN) PHOTOSENSITIVE RESIN COMPOSITION, TRANSFER FILM, PROTECTIVE FILM FOR TOUCH PANELS, TOUCH PANEL, METHOD FOR PRODUCING TOUCH PANEL, AND IMAGE DISPLAY DEVICE
(FR) COMPOSITION DE RÉSINE PHOTOSENSIBLE, FILM DE TRANSFERT, FILM PROTECTEUR POUR PANNEAUX TACTILES, PANNEAU TACTILE, PROCÉDÉ DE PRODUCTION DE PANNEAU TACTILE ET DISPOSITIF D'AFFICHAGE D'IMAGE
(JA) 感光性樹脂組成物、転写フィルム、タッチパネル用保護膜、タッチパネル及びその製造方法、並びに画像表示装置
Abstract:
(EN) A photosensitive resin composition which contains a photopolymerizable monomer having an ethylenically unsaturated group, a photopolymerization initiator, a polymer containing a constituent unit that has a carboxylic acid anhydride structure and a nitrogen-containing heterocyclic compound; and applications of this photosensitive resin composition.
(FR) L'invention porte sur une composition de résine photosensible qui contient un monomère photopolymérisable possédant un groupe à insaturation éthylénique, un initiateur de photopolymérisation, un polymère contenant une unité constitutive qui a une structure d'anhydride d'acide carboxylique et un composé hétérocyclique contenant de l'azote ; ainsi que sur des applications de cette composition de résine photosensible.
(JA) エチレン性不飽和基を有する光重合性モノマー、光重合開始剤、カルボン酸無水物構造を有する構成単位を含む重合体、及び含窒素複素環化合物を含有する感光性樹脂組成物並びにその応用。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)