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1. (WO2018042539) CIRCULAR ACCELERATOR
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2018/042539 International Application No.: PCT/JP2016/075460
Publication Date: 08.03.2018 International Filing Date: 31.08.2016
IPC:
H05H 7/08 (2006.01) ,H05H 13/00 (2006.01) ,H05H 13/02 (2006.01)
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
H
PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY- CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
7
Details of devices of the types covered by groups H05H9/-H05H13/102
08
Arrangements for injecting particles into orbits
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
H
PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY- CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
13
Magnetic resonance accelerators; Cyclotrons
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
H
PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY- CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
13
Magnetic resonance accelerators; Cyclotrons
02
Synchrocyclotrons, i.e. frequency-modulated cyclotrons
Applicants:
三菱電機株式会社 MITSUBISHI ELECTRIC CORPORATION [JP/JP]; 東京都千代田区丸の内二丁目7番3号 7-3, Marunouchi 2-chome, Chiyoda-ku, Tokyo 1008310, JP
Inventors:
宮下 裕次 MIYASHITA Yuji; JP
横井 武一郎 YOKOI Takeichiro; JP
Agent:
大岩 増雄 OIWA Masuo; JP
村上 啓吾 MURAKAMI Keigo; JP
竹中 岑生 TAKENAKA Mineo; JP
吉澤 憲治 YOSHIZAWA Kenji; JP
Priority Data:
Title (EN) CIRCULAR ACCELERATOR
(FR) ACCÉLÉRATEUR CIRCULAIRE
(JA) 円形加速器
Abstract:
(EN) In this invention, a beam generator comprises an ion source, an extraction electrode extracting charged particles from the ion source, a chopper electrode provided downstream from the extraction electrode and configured from an electrode pair facing one another across the charged particle trajectory, and a slit member provided downstream from the chopper electrode and having a slit wherethrough the charged particles pass. The beam generator is configured in such a manner as to cause the voltage applied between the electrode pair of the chopper electrode to change in order to change the trajectory of the charged particle, and, via the change in the trajectory, control passage/non-passage of the charged particles through the slit.
(FR) Dans la présente invention, un générateur de faisceau comprend une source d'ions, une électrode d'extraction extrayant des particules chargées de la source d'ions, une électrode de hacheur disposée en aval de l'électrode d'extraction et conçue à partir d'une paire d'électrodes se faisant face à travers la trajectoire de particules chargées, et un élément fendu disposé en aval de l'électrode de hacheur et ayant une fente dans laquelle passent les particules chargées. Le générateur de faisceau est conçu de manière à amener la tension appliquée entre la paire d'électrodes de l'électrode de hacheur à changer afin de modifier la trajectoire de la particule chargée, et, par l'intermédiaire du changement dans la trajectoire, à commander le passage/non-passage des particules chargées à travers la fente.
(JA) ビーム生成器が、イオン源と、このイオン源から荷電粒子を引き出す引出電極と、この引出電極の下流に設けられ荷電粒子の軌道を挟んで対向する電極対から構成されるチョッパー電極と、このチョッパー電極の下流に設けられ、荷電粒子を通過させるスリットを有するスリット部材とを備え、チョッパー電極の電極対間に印加する電圧を変化させることにより荷電粒子の軌道を変化させ、この軌道の変化により、荷電粒子のスリットの通過、非通過を制御するよう構成されている。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)