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1. (WO2018041695) PROCESS FOR THE GENERATION OF THIN INORGANIC FILMS
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Pub. No.: WO/2018/041695 International Application No.: PCT/EP2017/071236
Publication Date: 08.03.2018 International Filing Date: 23.08.2017
IPC:
C07F 15/00 (2006.01) ,C23C 16/455 (2006.01)
C CHEMISTRY; METALLURGY
07
ORGANIC CHEMISTRY
F
ACYCLIC, CARBOCYCLIC, OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
15
Compounds containing elements of the 8th Group of the Periodic System
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
44
characterised by the method of coating
455
characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber
Applicants:
BASF SE [DE/DE]; Carl-Bosch-Strasse 38 67056 Ludwigshafen am Rhein, DE
Inventors:
ADERMANN, Torben; DE
ABELS, Falko; DE
LIMBURG, Carolin; DE
WILMER, Hagen; DE
GERKENS, Jan; DE
SCHNEIDER, Sven; DE
Agent:
BASF IP ASSOCIATION; BASF SE G-FLP - C006 67056 Ludwigshafen, DE
Priority Data:
16186628.031.08.2016EP
Title (EN) PROCESS FOR THE GENERATION OF THIN INORGANIC FILMS
(FR) PROCÉDÉ DE PRODUCTION DE FILMS MINCES INORGANIQUES
Abstract:
(EN) The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. The present invention relates to a process for the generation of inorganic films comprising depositing the compound of general formula (I) onto a solid substrate (I), wherein M is Mn, Ni or Co, X is a ligand which coordinates M, n is 0, 1, 2, 3, or 4, R1 is an alkyl group, an alkenyl group, an aryl group, a halogen, or a silyl group, R2 is an alkyl group, an alkenyl group, an aryl group, or a silyl group, p and q are 1 or 2, wherein p + q = 3, and m is 1, 2, or 3.
(FR) La présente invention concerne le domaine des procédés de production de films minces inorganiques sur des substrats, en particulier des procédés de dépôt de couches atomiques. La présente invention concerne un procédé de génération de films inorganiques comprenant le dépôt du composé de formule générale (I) sur un substrat solide (I), où M est Mn, Ni ou Co, X est un ligand qui coordonne M, n est égal à 0, 1, 2, 3, ou 4, R 1 est un groupe alkyle, un groupe alcényle, un groupe aryle, un halogène, ou un groupe silyle, R 2 est un groupe alkyle, un groupe alcényle, un groupe aryle ou un groupe silyle, p et q valent 1 ou 2, p + q = 3, et m valant 1, 2 ou 3.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)