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1. (WO2018041599) LITHOGRAPHIC APPARATUS

Pub. No.:    WO/2018/041599    International Application No.:    PCT/EP2017/070394
Publication Date: Fri Mar 09 00:59:59 CET 2018 International Filing Date: Sat Aug 12 01:59:59 CEST 2017
IPC: G03F 7/20
Applicants: ASML NETHERLANDS B.V.
Inventors: VAN DER MEULEN, Frits
ARLEMARK, Erik, Johan
COX, Hendrikus, Herman, Marie
CUIJPERS, Martinus, Agnes, Willem
DE HOOGH, Joost
DE VRIES, Gosse, Charles
DE WIT, Paul , Corné, Henri
DERKS, Sander, Catharina, Reinier
GIJZEN, Ronald, Cornelis, Gerardus
HEMSCHOOTE, Dries, Vaast, Paul
HOOGENDAM, Christiaan, Alexander
KOEVOETS, Adrianus, Hendrik
LAFARRE, Raymond, Wilhelmus, Louis
LEROUX, Alain, Louis, Claude
LIMPENS, Patrick, Willem, Paul
OVERKAMP, Jim, Vincent
VALENTIN, Christiaan, Louis
VAN BERKEL, Koos
VAN DER MEULEN, Stan, Henricus
VAN DER SANDEN, Jacobus, Cornelis, Gerardus
VAN DER SCHOOT, Harmen, Klaas
VLES, David, Ferdinand
WESTERHUIS, Evert, Auke, Rinze
Title: LITHOGRAPHIC APPARATUS
Abstract:
A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.