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1. (WO2018041491) LITHOGRAPHIC APPARATUS

Pub. No.:    WO/2018/041491    International Application No.:    PCT/EP2017/069104
Publication Date: Fri Mar 09 00:59:59 CET 2018 International Filing Date: Sat Jul 29 01:59:59 CEST 2017
IPC: G03F 7/20
Applicants: ASML NETHERLANDS B.V.
Inventors: COX, Hendrikus, Herman, Marie
DE WIT, Paul , Corné, Henri
DEN BOEF, Arie, Jeffrey
KOEVOETS, Adrianus, Hendrik
OVERKAMP, Jim, Vincent
VAN DER MEULEN, Frits
VAN DER SANDEN, Jacobus, Cornelis, Gerardus
Title: LITHOGRAPHIC APPARATUS
Abstract:
A lithographic apparatus comprises a projection system which is configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table. The lithographic apparatus further comprises a heating apparatus comprises one or more radiation sources configured to provide additional radiation beams which illuminate and heat part of the substrate during the exposure.