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1. (WO2018040685) METHOD FOR DIRECTIONALLY CONSTRUCTING HETEROSTRUCTURE BY SELECTIVELY ETCHING FERROELECTRIC-BASED PHOTOCATALYTIC MATERIAL

Pub. No.:    WO/2018/040685    International Application No.:    PCT/CN2017/089681
Publication Date: Fri Mar 09 00:59:59 CET 2018 International Filing Date: Sat Jun 24 01:59:59 CEST 2017
IPC: B01J 21/06
B01J 23/14
B01J 23/843
B01J 37/10
Applicants: INSTITUTE OF METAL RESEARCH CHINESE ACADEMY OF SCIENCES
中国科学院金属研究所
Inventors: LIU, Gang
刘岗
MA, Li
马丽
ZHEN, Chao
甄超
YANG, Yongqiang
杨勇强
CHENG, Huiming
成会明
Title: METHOD FOR DIRECTIONALLY CONSTRUCTING HETEROSTRUCTURE BY SELECTIVELY ETCHING FERROELECTRIC-BASED PHOTOCATALYTIC MATERIAL
Abstract:
A method for directionally constructing a heterostructure by selectively etching a ferroelectric-based photocatalytic material, comprising: by using the feature that a ferroelectric field of a semiconductor ferroelectric material (barium titanate, lead titanate, bismuth ferrite or the like) induces a difference in surface charge property, so that negatively charged acid radical ions are preferentially and selectively adsorbed on a positively charged surface, placing the semiconductor ferroelectric material in a water solution containing etching acid, and selectively etching the surface of the ferroelectric material by means of a hydrothermal treatment process, to directionally construct a heterostructure on the surface of a ferroelectric substrate material. By means of the method, an optimal photocatalytic performance can be obtained by adjusting the type and concentration of acid, and a hydrothermal treatment temperature. The directional construction of a heterostructure facilitates the directional separation of photo-generated carriers, and can effectively improve the photocatalytic activity of the heterostructure.