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|1. (WO2018040685) METHOD FOR DIRECTIONALLY CONSTRUCTING HETEROSTRUCTURE BY SELECTIVELY ETCHING FERROELECTRIC-BASED PHOTOCATALYTIC MATERIAL|
|Applicants:||INSTITUTE OF METAL RESEARCH CHINESE ACADEMY OF SCIENCES
|Title:||METHOD FOR DIRECTIONALLY CONSTRUCTING HETEROSTRUCTURE BY SELECTIVELY ETCHING FERROELECTRIC-BASED PHOTOCATALYTIC MATERIAL|
A method for directionally constructing a heterostructure by selectively etching a ferroelectric-based photocatalytic material, comprising: by using the feature that a ferroelectric field of a semiconductor ferroelectric material (barium titanate, lead titanate, bismuth ferrite or the like) induces a difference in surface charge property, so that negatively charged acid radical ions are preferentially and selectively adsorbed on a positively charged surface, placing the semiconductor ferroelectric material in a water solution containing etching acid, and selectively etching the surface of the ferroelectric material by means of a hydrothermal treatment process, to directionally construct a heterostructure on the surface of a ferroelectric substrate material. By means of the method, an optimal photocatalytic performance can be obtained by adjusting the type and concentration of acid, and a hydrothermal treatment temperature. The directional construction of a heterostructure facilitates the directional separation of photo-generated carriers, and can effectively improve the photocatalytic activity of the heterostructure.