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|1. (WO2018040683) WET ETCHING DEVICE AND WET ETCHING METHOD FOR OXIDE SEMICONDUCTOR FILM|
|Applicants:||SUN YAT-SEN UNIVERSITY
FOSHAN RESEARCH INSTITUTE OF SUN YAT-SEN UNIVERSITY
|Title:||WET ETCHING DEVICE AND WET ETCHING METHOD FOR OXIDE SEMICONDUCTOR FILM|
A wet etching device and a wet etching method for an oxide semiconductor film. The wet etching device comprises: a manual sheet loading station (11), an etching paste spraying station (12), a reaction station (13), a cleaning station (14), an air-drying station (15), a pick-up station (16), a tooling tray recycling station (17), and a conveying apparatus. After being placed on a tooling tray (36) of the manual sheet loading station, a ZnO sheet sequentially passes the etching paste spraying station, the reaction station, the cleaning station, the air-drying station, and the pick-up station, and the empty tooling tray after pick-up is conveyed by the tooling tray recycling station to the manual sheet loading station for the next use. The wet etching device and the wet etching method can effectively alleviate the problem of lateral corrosion of ZnO films, and improve the product pass rate and the utilization rate of etching chemicals, and can be applied to large-scale continuous batch production.