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1. (WO2018039323) MONOLITHIC HIGH REFRACTIVE INDEX PHOTONIC DEVICES
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Pub. No.: WO/2018/039323 International Application No.: PCT/US2017/048182
Publication Date: 01.03.2018 International Filing Date: 23.08.2017
IPC:
G02B 1/04 (2006.01) ,B29C 59/02 (2006.01) ,B29D 11/00 (2006.01) ,G02C 7/00 (2006.01)
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
1
Optical elements characterised by the material of which they are made; Optical coatings for optical elements
04
made of organic materials, e.g. plastics
B PERFORMING OPERATIONS; TRANSPORTING
29
WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
C
SHAPING OR JOINING OF PLASTICS; SHAPING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL; AFTER- TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
59
Surface shaping, e.g. embossing; Apparatus therefor
02
by mechanical means, e.g. pressing
B PERFORMING OPERATIONS; TRANSPORTING
29
WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
D
PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
11
Producing optical elements, e.g. lenses or prisms
G PHYSICS
02
OPTICS
C
SPECTACLES; SUNGLASSES OR GOGGLES INSOFAR AS THEY HAVE THE SAME FEATURES AS SPECTACLES; CONTACT LENSES
7
Optical parts
Applicants:
MOLECULAR IMPRINTS, INC. [US/US]; 9801 Metric Blvd. Suite 100 Austin, Texas 78758, US
Inventors:
BHAGAT, Sharad D.; US
PEROZ, Christophe; US
SINGH, Vikramjit; US
XU, Frank Y.; US
Agent:
FLANAGAN, PH.D., Heather L.; US
Priority Data:
62/380,09326.08.2016US
62/502,97308.05.2017US
Title (EN) MONOLITHIC HIGH REFRACTIVE INDEX PHOTONIC DEVICES
(FR) DISPOSITIFS PHOTONIQUES MONOLITHIQUES À INDICE DE RÉFRACTION ÉLEVÉ
Abstract:
(EN) Fabricating a high refractive index photonic device includes disposing a polymerizable composition on a first surface of a first substrate and contacting the polymerizable composition with a first surface of a second substrate, thereby spreading the polymerizable composition on the first surface of the first substrate. The polymerizable composition is cured to yield a polymeric structure having a first surface in contact with the first surface of the first substrate, a second surface opposite the first surface of the polymeric structure and in contact with the first surface of the second substrate, and a selected residual layer thickness between the first surface of the polymeric structure and the second surface of the polymeric structure in the range of 10 µm to 1 cm. The polymeric structure is separated from the first substrate and the second substrate to yield a monolithic photonic device having a refractive index of at least 1.6.
(FR) La fabrication d'un dispositif photonique à indice de réfraction élevé comprend la disposition d'une composition polymérisable sur une première surface d'un premier substrat et la mise en contact de la composition polymérisable avec une première surface d'un second substrat, ce qui permet d'étaler la composition polymérisable sur la première surface du premier substrat. La composition polymérisable est durcie pour donner une structure polymère ayant une première surface en contact avec la première surface du premier substrat, une seconde surface opposée à la première surface de la structure polymère et en contact avec la première surface du second substrat, et une épaisseur de couche résiduelle sélectionnée entre la première surface de la structure polymère et la seconde surface de la structure polymère dans la plage de 10 µm à 1 cm. La structure polymère est séparée du premier substrat et du second substrat pour produire un dispositif photonique monolithique ayant un indice de réfraction d'au moins 1,6.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)