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1. (WO2018038495) SPUTTERING APPARATUS FOR FORMING NANOPOROUS STRUCTURE MEMBRANE
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2018/038495 International Application No.: PCT/KR2017/009120
Publication Date: 01.03.2018 International Filing Date: 22.08.2017
IPC:
C23C 14/34 (2006.01) ,C23C 14/56 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
34
Sputtering
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
56
Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
Applicants:
윤성호 YUN, Sung Ho [KR/KR]; KR
(주)광림정공 KWANG-LIM PRECISION CO.,LTD [KR/KR]; 대구시 달성군 구지면 달성2차로 179 179, Dalseong2cha-ro, Guji-myeon, Dalseong-gun, Daegu 43013, KR
Inventors:
윤성호 YUN, Sung Ho; KR
최병운 CHOI, Byung Woon; KR
Agent:
특허법인 웰 WELL PATENT LAW FIRM; 서울시 서초구 방배로 205 대명빌딩 신관 4층 4F. Daemyung Bldg. Shingwan 205, Bangbae-ro Seocho-gu, Seoul 06562, KR
Priority Data:
10-2016-010799624.08.2016KR
Title (EN) SPUTTERING APPARATUS FOR FORMING NANOPOROUS STRUCTURE MEMBRANE
(FR) APPAREIL DE PULVÉRISATION PERMETTANT DE FORMER UNE MEMBRANE À STRUCTURE NANOPOREUSE
(KO) 나노포러스 구조 막 형성용 스퍼터링 장치
Abstract:
(EN) The present invention relates to a sputtering apparatus for forming a nanoporous structure membrane, the apparatus being capable of controlling and forming a nanoporous structure having a desired size and a desired porosity, and to a sputtering apparatus for forming a nanoporous structure deposited on a substrate, the apparatus comprising: a process chamber in which the substrate is provided; a cluster source provided in the process chamber; and a nozzle provided between the cluster source and the process chamber, and having at least one opening, wherein pressure in the process chamber and pressure in the cluster source are different, and thus the size and density of nanoporous particles can be easily controlled and costs can be reduced during system configuration.
(FR) La présente invention concerne un appareil de pulvérisation permettant de former une membrane à structure nanoporeuse, l'appareil étant apte à commander et à former une structure nanoporeuse possédant une taille souhaitée et une porosité souhaitée, et un appareil de pulvérisation permettant de former une structure nanoporeuse déposée sur un substrat, l'appareil comprenant : une chambre de traitement dans laquelle le substrat est disposé; une source d'agglomérats disposée dans la chambre de traitement; et une buse disposée entre la source d'agglomérats et la chambre de traitement, et possédant au moins une ouverture, la pression dans la chambre de traitement et la pression dans la source d'agglomérats étant différentes, et ainsi la taille et la densité de particules nanoporeuses peuvent être facilement régulées et les coûts peuvent être réduits pendant la configuration du système.
(KO) 본 발명은 원하는 크기 및 원하는 기공률의 나노포러스(nanoporous) 구조 를 제어하여 형성할 수 있는 나노포러스 구조 막 형성용 스퍼터링 장치에 관한 것으로, 기판에 증착되는 나노포러스의 구조를 형성하기 위한 스퍼터링 장치로서, 상기 기판이 마련된 프로세스 챔버, 상기 프로세스 챔버에 마련된 클러스터 소스 및 상기 클러스터 소스와 프로세스 챔버 사이에 마련되고 적어도 하나의 개구를 구비한 노즐을 포함하고, 상기 프로세스 챔버의 내의 압력과 상기 클러스터 소스의 내의 압력은 상이한 구성을 마련하여, 나노포러스 입자의 크기 및 밀도를 용이하게 제어할 수 있고, 시스템 구성 시 비용을 절감할 수 있다.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Korean (KO)
Filing Language: Korean (KO)