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1. (WO2018038427) FAR-FIELD PLASMONIC LENS AND FAR-FIELD PLASMONIC LENS ASSEMBLY
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Pub. No.: WO/2018/038427 International Application No.: PCT/KR2017/008594
Publication Date: 01.03.2018 International Filing Date: 09.08.2017
IPC:
G02B 5/00 (2006.01) ,G01N 21/552 (2014.01) ,G02B 3/00 (2006.01)
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5
Optical elements other than lenses
[IPC code unknown for G01N 21/552]
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
3
Simple or compound lenses
Applicants:
한국기초과학지원연구원 KOREA BASIC SCIENCE INSTITUTE [KR/KR]; 대전시 유성구 과학로 169-148 169-148, Gwahak-ro Yuseong-gu Daejeon 34133, KR
Inventors:
김승현 KIM, Seung Hyun; KR
김건희 KIM, Geon Hee; KR
김이종 KIM, I Jong; KR
Agent:
신일균 SHIN, Ilkyun; KR
Priority Data:
10-2016-010666123.08.2016KR
Title (EN) FAR-FIELD PLASMONIC LENS AND FAR-FIELD PLASMONIC LENS ASSEMBLY
(FR) LENTILLE PLASMONIQUE DE CHAMP LOINTAIN ET ENSEMBLE DE LENTILLES PLASMONIQUES DE CHAMP LOINTAIN
(KO) 원거리장 플라즈모닉 렌즈 및 원거리장 플라즈모닉 렌즈 조립체
Abstract:
(EN) A far-field plasmonic lens according to the present invention comprises: a base substrate having a positive dielectric constant; and a nano structure array having a negative dielectric constant, and having a predetermined cross-sectional area and extending in a lengthwise direction at the upper part of the base substrate, wherein the nano structure array comprises a first nano structure formed at a central position, and a plurality of second nano structures arranged at intervals around the first nano structure.
(FR) Une lentille plasmonique à champ lointain selon la présente invention comprend : un substrat de base ayant une constante diélectrique positive; et un réseau de nanostructures ayant une constante diélectrique négative, et ayant une section transversale prédéterminée et s'étendant dans une direction longitudinale au niveau de la partie supérieure du substrat de base, le réseau de nanostructures comprenant une première nanostructure formée au niveau d'une position centrale, et une pluralité de secondes nanostructures agencées à des intervalles autour de la première nanostructure.
(KO) 본 발명에 따른 원거리장(far-field) 플라즈모닉 렌즈는 양의 유전율을 가지는 베이스 기판; 및 음의 유전율을 가지며, 상기 베이스 기판의 상부에 일정 단면적을 가지고 길이 방향으로 연장되어 형성되는 나노 구조체 어레이;를 포함하되, 상기 나노 구조체 어레이는 중심 위치에 형성되는 제1 나노 구조체와, 상기 제1 나노 구조체를 중심으로 이격 배열된 복수의 제2 나노 구조체를 포함한다.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Korean (KO)
Filing Language: Korean (KO)