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1. (WO2018038074) PHOTOSENSITIVE PASTE, CERAMIC GREEN SHEET, ELECTRONIC COMPONENT, PATTERN MANUFACTURING METHOD, AND ELECTRONIC COMPONENT MANUFACTURING METHOD
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Pub. No.: WO/2018/038074 International Application No.: PCT/JP2017/029859
Publication Date: 01.03.2018 International Filing Date: 22.08.2017
IPC:
G03F 7/027 (2006.01) ,G03F 7/004 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
027
Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
04
Chromates
Applicants:
東レ株式会社 TORAY INDUSTRIES, INC. [JP/JP]; 東京都中央区日本橋室町2丁目1番1号 1-1, Nihonbashi-Muromachi 2-chome, Chuo-ku, Tokyo 1038666, JP
Inventors:
杉崎祐真 SUGISAKI, Yuma; JP
山口美智子 YAMAGUCHI, Michiko; JP
山本洋平 YAMAMOTO, Youhei; JP
諏訪充史 SUWA, Mitsuhito; JP
Priority Data:
2016-16365824.08.2016JP
Title (EN) PHOTOSENSITIVE PASTE, CERAMIC GREEN SHEET, ELECTRONIC COMPONENT, PATTERN MANUFACTURING METHOD, AND ELECTRONIC COMPONENT MANUFACTURING METHOD
(FR) PÂTE PHOTOSENSIBLE, FEUILLE VERTE CÉRAMIQUE, COMPOSANT ÉLECTRONIQUE, PROCÉDÉ DE FABRICATION DE MOTIF ET PROCÉDÉ DE FABRICATION DE COMPOSANT ÉLECTRONIQUE
(JA) 感光性ペースト、セラミックグリーンシート、電子部品、パターンの製造方法および電子部品の製造方法
Abstract:
(EN) The purpose of the present invention is to provide a photosensitive paste with which it is possible to form a fine pattern even in a thick film. The present invention is a photosensitive paste containing an inorganic powder (A), an alkali-soluble resin (B), at least one reactive compound (C) selected from compounds having the structure represented in the general formula (1) or (2) below, a photosensitizer (D), and a solvent (E). (In general formula (1), R1, R2, and R3 each individually represent hydrogen or a monovalent organic group. R1 and R2 may be linked to each other.) (In general formula (2), R4, R5, and R6 each individually represent hydrogen or a monovalent organic group. At least one of R4, R5, and R6 has a radical polymerizable group.)
(FR) Le but de la présente invention est de fournir une pâte photosensible à l'aide de laquelle il est possible de former un motif fin même dans un film épais. La présente invention concerne une pâte photosensible contenant une poudre inorganique (A), une résine soluble dans les alcalis (B), au moins un composé réactif (C) choisi parmi des composés ayant la structure représentée dans la formule générale (1) ou (2) ci-dessous, un photosensibilisateur (D), et un solvant (E). (Dans la formule générale (1), R1, R2, et R3 représentent chacun individuellement un atome d'hydrogène ou un groupe organique monovalent. R1 et R2 peuvent être reliés l'un à l'autre.) (Dans la formule générale (2), R4, R5, et R6 représentent chacun individuellement un atome d'hydrogène ou un groupe organique monovalent. R4, R5, et/ou R6 a/ont un groupe polymérisable par voie radicalaire.)
(JA) 本発明の目的は、厚膜においても微細パターンを形成可能な感光性ペーストを提供することであり。本発明は、無機粉末(A)、アルカリ可溶性樹脂(B)、下記一般式(1)または(2)で表される構造を有する化合物から選ばれる少なくとも1種の反応性化合物(C)、感光剤(D)および溶剤(E)を含有する感光性ペーストである。 (一般式(1)中、R、R、Rはそれぞれ独立に水素または1価の有機基を表す。RおよびRは互いに連結していても構わない。) (一般式(2)中、R、R、Rはそれぞれ独立に水素または1価の有機基を表す。ただし、R、R、Rの少なくとも1つにラジカル重合性基を有する。)
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)