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1. (WO2018037912) PHOTOCURABLE RESIN COMPOSITION, INK AND COATING MATERIAL
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.: WO/2018/037912 International Application No.: PCT/JP2017/028766
Publication Date: 01.03.2018 International Filing Date: 08.08.2017
IPC:
C08F 26/06 (2006.01) ,C08F 2/50 (2006.01) ,C08F 271/02 (2006.01) ,C09D 4/00 (2006.01) ,C09D 7/12 (2006.01) ,C09D 11/101 (2014.01) ,C09D 139/04 (2006.01)
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
26
Homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen
06
by a heterocyclic ring containing nitrogen
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
2
Processes of polymerisation
46
Polymerisation initiated by wave energy or particle radiation
48
by ultra-violet or visible light
50
with sensitising agents
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
F
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
271
Macromolecular compounds obtained by polymerising monomers on to polymers of nitrogen-containing monomers as defined in group C08F26/154
02
on to polymers of monomers containing heterocyclic nitrogen
C CHEMISTRY; METALLURGY
09
DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
D
COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
4
Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond
C CHEMISTRY; METALLURGY
09
DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
D
COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
7
Features of coating compositions, not provided for in group C09D5/88
12
Other additives
[IPC code unknown for C09D 11/101]
C CHEMISTRY; METALLURGY
09
DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
D
COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
139
Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen; Coating compositions based on derivatives of such polymers
04
Homopolymers or copolymers of monomers containing heterocyclic rings having nitrogen as ring member
Applicants:
株式会社大阪ソーダ OSAKA SODA CO., LTD. [JP/JP]; 大阪府大阪市西区阿波座1丁目12番18号 12-18, Awaza 1-chome, Nishi-ku, Osaka-shi, Osaka 5500011, JP
Inventors:
本村 優奈 HONMURA, Yuna; JP
井上 聡 INOUE, Satoshi; JP
大橋 伸一郎 OHASHI, Shinichiro; JP
横山 勝敏 YOKOYAMA, Katsutoshi; JP
Agent:
特許業務法人 安富国際特許事務所 YASUTOMI & ASSOCIATES; 大阪府大阪市淀川区宮原3丁目5番36号 5-36, Miyahara 3-chome, Yodogawa-ku, Osaka-shi, Osaka 5320003, JP
Priority Data:
2016-16176722.08.2016JP
Title (EN) PHOTOCURABLE RESIN COMPOSITION, INK AND COATING MATERIAL
(FR) COMPOSITION DE RÉSINE PHOTODURCISSABLE, ENCRE ET MATÉRIAU DE REVÊTEMENT
(JA) 光硬化性樹脂組成物、インキ及び塗料
Abstract:
(EN) The present invention provides a photocurable resin composition which contains a polymer (A) that exhibits excellent adhesion to a plastic base. The present invention relates to a photocurable resin composition which is characterized by containing a polymer (A) that is obtained by polymerizing a compound represented by general formula (I). (In the formula, each R1 represents a (-CH2-CR3=CHR2) group, a glycidyl group, an alkyl group having 1-5 carbon atoms or a hydrogen atom; the R1 moieties may be the same as or different from each other, and at least one of the R1 moieties is a (-CH2-CR3=CHR2) group; and each of R2 and R3 in the (-CH2-CR3=CHR2) group represents H or CH3.)
(FR) La présente invention concerne une composition de résine photodurcissable qui contient un polymère (A) qui présente une excellente adhérence à une base en plastique. La présente invention concerne une composition de résine photodurcissable qui est caractérisée en ce qu'elle contient un polymère (A) qui est obtenu par polymérisation d'un composé représenté par la formule générale (I). (Dans la formule, chaque R1 représente un groupe (-CH2-CR3=CHR2), un groupe glycidyle, un groupe alkyle ayant de 1 à 5 atomes de carbone ou un atome d'hydrogène ; les fractions R1 peuvent être identiques ou différentes les unes des autres, et au moins l'une des fractions R1 est un groupe (-CH2-CR3=CHR2) ; et chacun de R2 et R3 dans le groupe (-CH2-CR3=CHR2) représente H ou CH3.)
(JA) 本発明は、プラスチック基材との密着性に優れた重合体(A)を含む光硬化性樹脂組成物を提供する。 本発明は、一般式[I]で表される化合物を重合して得られる重合体(A)を含有することを特徴とする光硬化性樹脂組成物に関する(式中、Rは[-CH-CR=CHR]基、グリシジル基、炭素数1~5アルキル基又は水素原子を表し、それぞれのRは異なっていても同一でもよく、そのうちの少なくとも1個は[-CH-CR=CHR]基であり、[-CH-CR=CHR]基中のR及びRは、それぞれ、H又はCHを表す。)。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)