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1. (WO2018037504) METHOD FOR REMOVING IMPURITIES
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2018/037504 International Application No.: PCT/JP2016/074673
Publication Date: 01.03.2018 International Filing Date: 24.08.2016
IPC:
B01D 53/18 (2006.01) ,B01D 47/02 (2006.01) ,B01D 47/04 (2006.01) ,B01D 53/50 (2006.01) ,B01D 53/68 (2006.01) ,B01D 53/78 (2006.01)
B PERFORMING OPERATIONS; TRANSPORTING
01
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
D
SEPARATION
53
Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases or aerosols
14
by absorption
18
Absorbing units; Liquid distributors therefor
B PERFORMING OPERATIONS; TRANSPORTING
01
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
D
SEPARATION
47
Separating dispersed particles from gases, air or vapours by liquid as separating agent
02
by passing the gas or air or vapour over or through a liquid bath
B PERFORMING OPERATIONS; TRANSPORTING
01
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
D
SEPARATION
47
Separating dispersed particles from gases, air or vapours by liquid as separating agent
04
by passing the gas or air or vapour through foam
B PERFORMING OPERATIONS; TRANSPORTING
01
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
D
SEPARATION
53
Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases or aerosols
34
Chemical or biological purification of waste gases
46
Removing components of defined structure
48
Sulfur compounds
50
Sulfur oxides
B PERFORMING OPERATIONS; TRANSPORTING
01
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
D
SEPARATION
53
Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases or aerosols
34
Chemical or biological purification of waste gases
46
Removing components of defined structure
68
Halogens or halogen compounds
B PERFORMING OPERATIONS; TRANSPORTING
01
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
D
SEPARATION
53
Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases or aerosols
34
Chemical or biological purification of waste gases
74
General processes for purification of waste gases; Apparatus or devices specially adapted therefor
77
Liquid phase processes
78
with gas-liquid contact
Applicants:
千代田化工建設株式会社 CHIYODA CORPORATION [JP/JP]; 神奈川県横浜市西区みなとみらい四丁目6番2号 4-6-2, Minatomirai, Nishi-ku, Yokohama-shi, Kanagawa 2208765, JP
Inventors:
亀田 孝雄 KAMEDA, Takao; JP
武井 昇 TAKEI, Noboru; JP
熊谷 和也 KUMAGAI, Kazuya; JP
城戸 操介 KIDO, Sosuke; JP
上村 正隆 UEMURA, Masataka; JP
Agent:
三木 友由 MIKI Tomoyoshi; JP
Priority Data:
Title (EN) METHOD FOR REMOVING IMPURITIES
(FR) PROCÉDÉ D'ÉLIMINATION D'IMPURETÉS
(JA) 不純物除去方法
Abstract:
(EN) The purpose of the present invention is to provide a method for removing impurities that makes it possible to efficiently and inexpensively remove impurities such as dust and soot contained in a gas such as exhaust gas. Provided is a method for removing impurities, in which impurities in exhaust gas are removed, the method comprising a step for forming a froth layer A in a tank 1 by blowing the exhaust gas through an exhaust gas dispersion tube 7 into an absorbing solution accommodated within the tank 1, wherein: the gas holdup in the froth layer A is set to 0.4 to 0.9, the gas holdup being the proportion of gas that makes up the froth layer A; the height of the froth layer A is set to 0.2 to 1.8 m; and the gas-liquid contact surface area per unit volume of the froth layer A is set to 1500 to 2500 m2/m3. Due to this configuration, it is possible to efficiently and inexpensively remove impurities such as dust and soot contained in a gas such as exhaust gas.
(FR) Le but de la présente invention est de fournir un procédé d'élimination d'impuretés qui permet d'éliminer efficacement et de manière peu coûteuse des impuretés telles que la poussière et la suie contenues dans un gaz tel que les gaz d'échappement. L'invention concerne un procédé d'élimination d'impuretés, dans lequel des impuretés dans les gaz d'échappement sont éliminées, le procédé comprenant une étape consistant à former une couche de mousse A dans un réservoir 1 en soufflant le gaz d'échappement à travers un tube de dispersion de gaz d'échappement 7 dans une solution absorbante logée à l'intérieur du réservoir 1, dans lequel : la rétention de gaz dans la couche de mousse A est réglée à 0,4 à 0,9, la rétention de gaz étant la proportion de gaz qui constitue la couche de mousse A; la hauteur de la couche de mousse A est réglée à 0,2 à 1,8 m; et la surface de contact gaz-liquide par volume unitaire de la couche de mousse A est fixée à 1500 à 2500 m2/m3. Grâce à cette configuration, il est possible d'éliminer de manière efficace et peu coûteuse des impuretés telles que la poussière et la suie contenues dans un gaz tel que des gaz d'échappement.
(JA) 排ガス等の気体中に含まれるばいじん等の不純物を効率よく、低コストで除去することができる不純物除去方法を提供する。 槽1内に収容されている吸収液中に、排ガス分散管7を通して排ガスを吹き込むことにより、槽1内にフロス層Aを形成する工程を有する排ガス中の不純物を除去する不純物除去方法であって、フロス層Aにおけるガスの占める割合をガスホールドアップとすると、フロス層Aにおけるガスホールドアップを0.4~0.9に設定すること、フロス層Aの高さを0.2~1.8mに設定すること、フロス層Aの単位体積当たりの気液接触面積を1500~2500m/mに設定することによって、排ガス等の気体中に含まれるばいじん等の不純物を効率よく、低コストで除去することができる。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)