Some content of this application is unavailable at the moment.
If this situation persist, please contact us atFeedback&Contact
1. (WO2018037448) WAVEFRONT MEASUREMENT DEVICE AND OPTICAL SYSTEM ASSEMBLY DEVICE
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2018/037448 International Application No.: PCT/JP2016/074360
Publication Date: 01.03.2018 International Filing Date: 22.08.2016
IPC:
G01J 9/00 (2006.01) ,G01M 11/02 (2006.01)
G PHYSICS
01
MEASURING; TESTING
J
MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
9
Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
G PHYSICS
01
MEASURING; TESTING
M
TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
11
Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
02
Testing of optical properties
Applicants:
三菱電機株式会社 MITSUBISHI ELECTRIC CORPORATION [JP/JP]; 東京都千代田区丸の内二丁目7番3号 7-3, Marunouchi 2-chome, Chiyoda-ku, Tokyo 1008310, JP
Inventors:
尾野 仁深 ONO, Hitomi; JP
鈴木 二郎 SUZUKI, Jiro; JP
三輪 佳史 MIWA, Yoshichika; JP
安藤 俊行 ANDO, Toshiyuki; JP
Agent:
田澤 英昭 TAZAWA, Hideaki; JP
濱田 初音 HAMADA, Hatsune; JP
中島 成 NAKASHIMA, Nari; JP
坂元 辰哉 SAKAMOTO, Tatsuya; JP
辻岡 将昭 TSUJIOKA, Masaaki; JP
井上 和真 INOUE, Kazuma; JP
Priority Data:
Title (EN) WAVEFRONT MEASUREMENT DEVICE AND OPTICAL SYSTEM ASSEMBLY DEVICE
(FR) DISPOSITIF DE MESURE DE FRONT D'ONDE ET DISPOSITIF D'ASSEMBLAGE DE SYSTÈME OPTIQUE
(JA) 波面計測装置及び光学系組み立て装置
Abstract:
(EN) A wavefront measurement device is provided with a light source system (26) for illuminating an optical system (3) under inspection and causing beams of light having a plurality of wavefront measurement fields of view to be emitted from the optical system (3) under inspection, a single wavefront sensor (28) for measuring the beams of light having a plurality of wavefront measurement fields of view emitted from the optical system (3) under inspection and calculating wavefront aberration, and an optical path optical system (31) for selectively causing the beams of light having a plurality of wavefront measurement fields of view emitted from the optical system (3) under inspection to fall on the wavefront sensor (28).
(FR) L'invention concerne un dispositif de mesure de front d'onde pourvu d'un système de source de lumière (26) permettant d'éclairer un système optique (3) inspecté et amenant des faisceaux de lumière ayant une pluralité de champs de vision de mesure de front d'onde à être émis par le système optique (3) inspecté, d'un capteur de front d'onde unique (28) permettant de mesurer les faisceaux de lumière ayant une pluralité de champs de vision de mesure de front d'onde émis par le système optique (3) inspecté et de calculer une aberration de front d'onde, et d'un système optique de trajet optique (31) permettant d'amener sélectivement les faisceaux de lumière ayant une pluralité de champs de vision de mesure de front d'onde émis par le système optique (3) inspecté à arriver sur le capteur de front d'onde (28).
(JA) 被検光学系(3)を照明し、複数の波面計測視野の光束を被検光学系3から出射させる光源系(26)と、被検光学系(3)から出射される複数の波面計測視野の光束を計測し、波面収差を算出する1つの波面センサ(28)と、被検光学系(3)から出射される複数の波面計測視野の光束を、波面センサ(28)に選択的に入射させる光路光学系(31)とを備える。
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)