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1. (WO2018037014) SUSCEPTOR FOR A CHEMICAL VAPOUR DEPOSITION REACTOR

Pub. No.:    WO/2018/037014    International Application No.:    PCT/EP2017/071152
Publication Date: Fri Mar 02 00:59:59 CET 2018 International Filing Date: Wed Aug 23 01:59:59 CEST 2017
IPC: C23C 16/458
C30B 25/12
H01L 21/687
Applicants: AIXTRON SE
Inventors: CLASSENS, Daniel
BOYD, Adam
O'DOWD, James
FERON, Olivier
Title: SUSCEPTOR FOR A CHEMICAL VAPOUR DEPOSITION REACTOR
Abstract:
The invention relates to a susceptor (1) for a CVD-reactor having insertion openings (3) arranged in a bearing surface (2), in which an insertion section (13) of a positioning element (12) that forms positioning flanks (15) with a section (14) projecting from the insertion opening (3) for fixing the position of a substrate (11), pushes into, said insertion openings (3) having side walls (5) and a base (4) and the insertion section (13) comprises bearing areas (17') adjacent to the side walls (5) and a lower side (16) facing the base (4). The novelty relates to a distance (a) between the base (4) and the lower side (16) or an edge protruding section (18), forming the positioning flanks (15), of the section projecting from the insertion opening (3), said section projects over the bearing surface (2) at a distance (b) with a section (9, 6') resting on the edge of the insertion opening (3).