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1. (WO2018034933) METHOD AND APPARATUS FOR CONTROLLING GAS FLOW TO A PROCESS CHAMBER

Pub. No.:    WO/2018/034933    International Application No.:    PCT/US2017/046267
Publication Date: Fri Feb 23 00:59:59 CET 2018 International Filing Date: Fri Aug 11 01:59:59 CEST 2017
IPC: C23C 16/52
C23C 16/455
C23C 16/54
B01J 4/00
Applicants: APPLIED MATERIALS, INC.
Inventors: NGUYEN, Andrew
CHANG, Xue
Title: METHOD AND APPARATUS FOR CONTROLLING GAS FLOW TO A PROCESS CHAMBER
Abstract:
Methods and apparatus for controlling gas flow to a process chamber are disclosed herein. In some embodiments, a processing system includes a first process chamber having a first gas input; a first gas break disposed upstream of the first gas input; a first adjustable valve disposed upstream of the first gas break; and a first isolation valve disposed upstream of the first adjustable valve. The processing system may further include a second process chamber having a second gas input; a second gas break disposed upstream of the second gas input; a second adjustable valve disposed upstream of the second gas break; and a second isolation valve disposed upstream of the second adjustable valve. A shared gas source may be disposed upstream of the first isolation valve and the second isolation valve to provide one or more gases to the first process chamber and to the second process chamber.