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1. (WO2018034380) HIGH-PERFORMANCE MASK ALIGNER STAGE LEVELLING APPARATUS HAVING IMPROVED LEVELLING MAINTENANCE FORCE
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Pub. No.: WO/2018/034380 International Application No.: PCT/KR2016/012563
Publication Date: 22.02.2018 International Filing Date: 03.11.2016
IPC:
H01L 21/68 (2006.01) ,H01L 21/027 (2006.01) ,H01L 21/683 (2006.01) ,H01L 21/687 (2006.01) ,G03F 7/20 (2006.01) ,G03F 9/00 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
68
for positioning, orientation or alignment
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
027
Making masks on semiconductor bodies for further photolithographic processing, not provided for in group H01L21/18 or H01L21/34165
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
683
for supporting or gripping
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
683
for supporting or gripping
687
using mechanical means, e.g. chucks, clamps or pinches
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
9
Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
Applicants:
마이다스시스템주식회사 MIDAS SYSTEM CO., LTD. [KR/KR]; 대전시 유성구 테크노2로 120-1 (용산동) (Yongsan-dong) 120-1, Techno 2-ro, Yuseong-gu, Daejeon 34029, KR
Inventors:
이곤철 LEE, Gon Cheol; KR
민흥기 MIN, Heung Ki; KR
이준형 LEE, Joon Hyoung; KR
전재근 JEON, Jea Keun; KR
Agent:
성낙훈 SEONG, Nak Hoon; KR
Priority Data:
10-2016-010357316.08.2016KR
Title (EN) HIGH-PERFORMANCE MASK ALIGNER STAGE LEVELLING APPARATUS HAVING IMPROVED LEVELLING MAINTENANCE FORCE
(FR) APPAREIL DE NIVELAGE DE PLATINE D’ALIGNEUR DE MASQUE HAUTE PERFORMANCE AYANT UNE FORCE DE MAINTIEN DE NIVELAGE AMÉLIORÉE
(KO) 레벨링 유지력이 향상된 고성능 마스크 얼라이너용 스테이지 레벨링장치
Abstract:
(EN) The present invention relates to a high-performance mask aligner stage levelling apparatus having improved levelling maintenance force and, specifically, to an advanced concept technology for preventing the crookedness of levelling by securely fixing a completely levelled wafer stage. A conventionally disclosed levelling apparatus allows a completely levelled wafer stage to be fixed by a method for partially pressing the side of a levelling rod, such that the levelling thereof is crooked because of a deviation (error) generated while the levelling rod moves vertically and horizontally, and the maximum levellable weight of a wafer (sample) is inevitably reduced while a slip occurs because of a weak fixing force of the levelling rod. In order to remove problems, the present invention adopts a technology for enabling both sides of the levelling rod to be pressed, fixed, and locked by the inner peripheral surface of a locking ring when the locking ring fitted onto the outer side of the levelling rod maintains an inclined state, and enabling the levelling rod to be unlocked while the inner peripheral surface of the locking ring is spaced from the levelling rod when the locking ring maintains a horizontal state.
(FR) La présente invention concerne un appareil de nivelage de platine d’aligneur de masque haute performance ayant une force de maintien de nivelage améliorée et, spécifiquement, une technologie de concept avancée pour éviter l’altération du nivelage par la fixation sécurisée d’une platine de tranche totalement nivelée. Un appareil de nivelage conventionnellement décrit permet qu’une platine de tranche totalement nivelée soit fixée par un procédé pour presser partiellement le côté d’une tige de nivellement, de sorte que le nivelage de celle-ci soit altéré en raison d’un écart (erreur) généré tandis que la tige de nivelage se déplace verticalement et horizontalement, et le poids nivelable maximal d’une tranche (échantillon) est inévitablement réduit tandis qu’un glissement se produit en raison d’une force de fixation faible de la tige de nivelage. Afin d’éliminer les problèmes, la présente invention adopte une technologie pour permettre que les deux côtés de la tige de nivelage soient pressés, fixés et verrouillés par la surface périphérique interne d’une bague de verrouillage lorsque la bague de verrouillage ajustée sur le côté externe de la tige de nivelage maintient un état incliné, et permettre que la tige de mise à niveau soit déverrouillée tandis que la surface périphérique interne de la bague de verrouillage est espacée de la tige de nivellement lorsque la bague de verrouillage maintient un état horizontal.
(KO) 본 발명은 레벨링 유지력이 향상된 고성능 마스크 얼라이너용 스테이지 레벨링장치에 관한 것으로, 특히 레벨링이 완료된 웨이퍼 스테이지를 확실하게 고정하여 레벨링의 틀어짐을 방지하는 신개념의 기술에 관한 것이다. 종래에 개시된 레벨링장치는 레벨링 로드의 측면을 부분적으로 가압하는 방법으로 레벨링이 완료된 웨이퍼 스테이지를 고정함으로써 상기 레벨링 로드가 상하 좌우로 유동하면서 발생하는 편차(에러)에 의해 레벨링이 틀어지고, 상기 레벨링 로드의 고정력이 약해 슬립이 발생하면서 최대 레벨링이 가능한 웨이퍼(샘플)의 무게가 그만큼 줄어들 수밖에 없는 실정이다. 본 발명은 이러한 문제점을 일소하기 위한 방안으로 레벨링 로드의 외측에 끼워진 록킹 링이 경사상태를 유지할 때에는 록킹 링의 내주면이 레벨링 로드의 양측을 가압 고정하면서 록킹할 수 있도록 하고, 상기 록킹 링이 수평상태를 유지할 때에는 록킹 링의 내주면이 레벨링 로드와 이격되면서 록킹을 해제할 수 있도록 하는 기술을 강구함을 특징으로 한다.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Korean (KO)
Filing Language: Korean (KO)