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1. (WO2018034202) COMPOSITION
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Pub. No.: WO/2018/034202 International Application No.: PCT/JP2017/028728
Publication Date: 22.02.2018 International Filing Date: 08.08.2017
IPC:
C08L 71/02 (2006.01) ,C03C 17/30 (2006.01) ,C08G 65/336 (2006.01) ,C09K 3/18 (2006.01)
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
L
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
71
Compositions of polyethers obtained by reactions forming an ether link in the main chain; Compositions of derivatives of such polymers
02
Polyalkylene oxides
C CHEMISTRY; METALLURGY
03
GLASS; MINERAL OR SLAG WOOL
C
CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
17
Surface treatment of glass, e.g. of devitrified glass, not in the form of fibres or filaments, by coating
28
with organic material
30
with silicon-containing compounds
C CHEMISTRY; METALLURGY
08
ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
G
MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
65
Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
02
from cyclic ethers by opening of the heterocyclic ring
32
Polymers modified by chemical after-treatment
329
with organic compounds
336
containing silicon
C CHEMISTRY; METALLURGY
09
DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
K
MATERIALS FOR APPLICATIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
3
Materials not provided for elsewhere
18
for application to surface to minimize adherence of ice, mist or water thereto; Thawing or antifreeze materials for application to surfaces
Applicants: SUMITOMO CHEMICAL COMPANY, LIMITED[JP/JP]; 27-1, Shinkawa 2-chome, Chuo-ku, Tokyo 1048260, JP
Inventors: SAKURAI, Sayaka; JP
MIYAMOTO, Tomonori; JP
UEHARA, Michiru; JP
Agent: NAKAYAMA, Tohru; JP
SAKAMOTO, Toru; JP
Priority Data:
2016-16147019.08.2016JP
Title (EN) COMPOSITION
(FR) COMPOSITION
(JA) 組成物
Abstract:
(EN) The purpose of the present invention is to provide a coating composition having good wear resistance. The present invention is a composition characterized by comprising: a compound (A) in which (a1) a monovalent group having a perfluoropolyether structure and (a2) at least either one of a hydrolyzable group and a hydroxy group are bonded to a silicon atom; and a compound (B) having a number-average molecular weight of less than 10,000 and having a hydroxy group and an oxyalkylene unit, at least some of hydrogen atoms in the oxyalkylene unit being substituted with a fluorine atom.
(FR) L'objet de la présente invention est de produire une composition de revêtement présentant une bonne résistance à l'usure. La présente invention concerne une composition caractérisée en ce qu'elle comprend : un composé (A) dans lequel (a1) un groupe monovalent ayant une structure perfluoropolyéther et (a2) au moins un des deux groupes choisis parmi un groupe hydrolysable et un groupe hydroxy sont liés à un atome de silicium ; et un composé (B) ayant un poids moléculaire moyen en nombre inférieur à 10 000 et comportant un groupe hydroxy et une unité oxyalkylène, au moins une partie des atomes d'hydrogène présents dans l'unité oxyalkylène étant substituée par un atome de fluor.
(JA) 良好な耐摩耗性を有するコーティング組成物を提供することを目的とする。 本発明は、(a1)パーフルオロポリエーテル構造を有する1価の基と、(a2)加水分解性基及びヒドロキシ基の少なくともいずれか一方とが、ケイ素原子に結合している化合物(A)及び、 ヒドロキシ基とオキシアルキレン単位を有し、オキシアルキレン単位の水素原子の少なくとも一部がフッ素原子に置換されており、数平均分子量が10000未満である化合物(B)とを含むことを特徴とする組成物である。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)