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1. (WO2018034145) METHOD FOR PRODUCING FLUORINE-CONTAINING SULFONYLAMIDE COMPOUND
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.:    WO/2018/034145    International Application No.:    PCT/JP2017/027900
Publication Date: 22.02.2018 International Filing Date: 01.08.2017
IPC:
C01B 21/093 (2006.01), C01B 21/086 (2006.01)
Applicants: NIPPON SODA CO., LTD. [JP/JP]; 2-1, Ohtemachi 2-chome, Chiyoda-ku, Tokyo 1008165 (JP)
Inventors: TSUBOKURA, Shiro; (JP).
AOMORI, Yuka; (JP).
KAKO, Satoshi; (JP)
Agent: HIROTA, Masanori; (JP)
Priority Data:
2016-161295 19.08.2016 JP
Title (EN) METHOD FOR PRODUCING FLUORINE-CONTAINING SULFONYLAMIDE COMPOUND
(FR) PROCÉDÉ DE FABRICATION DE COMPOSÉ SULFONYLE AMIDE À TENEUR EN FLUOR
(JA) フッ素含有スルホニルアミド化合物の製造方法
Abstract: front page image
(EN)The purpose of the present invention is to provide a method for efficiently removing impurities, such as sodium ions, fluoride ions, chloride ions, and fluorosulfate ions, without lowering the yield of a target product. The present invention is characterized by using an aqueous sulfate solution to wash a fluorine-containing sulfonylamide compound selected from the group consisting of fluorine-containing sulfonylamide, a metal salt thereof, an ammonium salt thereof, and a quaternary ammonium salt thereof.
(FR)L’invention a pour objet de fournir un procédé destiné à éliminer de manière efficace des impuretés telles que des ions sodium, des ions fluorure, des ions chlorure, des ions d’acide fluorosulfurique, sans abaisser le rendement d’une substance objet. Le procédé de l’invention est caractéristique en ce qu’un composé sulfonyle amide à teneur en fluor choisi dans un groupe constitué d’un sulfonyle amide à teneur en fluor, d’un sel de métal de celui-ci, d’un sel d’ammonium de celui-ci, et d’un sel d’ammonium quaternaire de celui-ci, est lavé au moyen d’une solution aqueuse de sulfate.
(JA)本発明は、目的物の収率を低下することなく、ナトリウムイオン、フッ化物イオン、塩化物イオン、フルオロ硫酸イオン等の不純物を効率よく除去する方法を提供することを目的とする。本発明は、フッ素含有スルホニルアミド、その金属塩、そのアンモニウム塩及びその4級アンモニウム塩からなる群から選ばれるフッ素含有スルホニルアミド化合物を、硫酸塩水溶液を用いて洗浄することを特徴とする。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)