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1. (WO2018034020) SOFT X-RAY SOURCE, EXPOSURE APPARATUS, AND MICROSCOPE

Pub. No.:    WO/2018/034020    International Application No.:    PCT/JP2017/012554
Publication Date: Fri Feb 23 00:59:59 CET 2018 International Filing Date: Wed Mar 29 01:59:59 CEST 2017
IPC: G03F 7/20
G21K 5/02
G21K 7/00
H05G 2/00
H05H 1/24
Applicants: TOHOKU UNIVERSITY
国立大学法人東北大学
Inventors: EJIMA, Takeo
江島丈雄
KADO, Masataka
加道雅孝
SHINOHARA, Kunio
篠原邦夫
KISHIMOTO, Maki
岸本牧
Title: SOFT X-RAY SOURCE, EXPOSURE APPARATUS, AND MICROSCOPE
Abstract:
This soft X-ray source is provided with: a laser device 36 which generates a plasma containing an element included in a target 32 by irradiating the target with a laser beam 60, and causes soft X-rays 62 to radiate from the plasma; and a chamber 30 which houses the target in the interior thereof and which, when the laser device irradiates the target with the laser beam, adjusts the gas pressure of a gas in the interior to a pressure not lower than 10 Pa but lower than the atmospheric pressure.