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1. (WO2018032913) METHOD FOR PREPARING SPACER AND METHOD FOR PREPARING DISPLAY SUBSTRATE
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Pub. No.: WO/2018/032913 International Application No.: PCT/CN2017/092617
Publication Date: 22.02.2018 International Filing Date: 12.07.2017
IPC:
G03F 7/00 (2006.01) ,G02F 1/1339 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G PHYSICS
02
OPTICS
F
DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
1
Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
01
for the control of the intensity, phase, polarisation or colour
13
based on liquid crystals, e.g. single liquid crystal display cells
133
Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
1333
Constructional arrangements
1339
Gaskets; Spacers; Sealing of the cell
Applicants:
京东方科技集团股份有限公司 BOE TECHNOLOGY GROUP CO., LTD. [CN/CN]; 中国北京市 朝阳区酒仙桥路10号 No.10 Jiuxianqiao Road, Chaoyang District Beijing 100015, CN
Inventors:
郑奉官 JUNG, Bongkwan; CN
王伟杰 WANG, Weijie; CN
曾庆慧 ZENG, Qinghui; CN
Agent:
中国专利代理(香港)有限公司 CHINA PATENT AGENT (H.K.) LTD.; 中国香港特别行政区 湾仔港湾道23号鹰君中心22号楼 22/F, Great Eagle Centre 23 Harbour Road, Wanchai Hong Kong, CN
Priority Data:
201610681530.617.08.2016CN
Title (EN) METHOD FOR PREPARING SPACER AND METHOD FOR PREPARING DISPLAY SUBSTRATE
(FR) PROCÉDÉ DE PRÉPARATION DE PIÈCE INTERCALAIRE ET PROCÉDÉ DE PRÉPARATION D’UN SUBSTRAT D’AFFICHAGE
(ZH) 隔垫物的制备方法和显示基板的制备方法
Abstract:
(EN) A method for preparing a spacer and a method for preparing a display substrate. The method for preparing a spacer comprises: overdeveloping an exposed photoresist layer to form a first photoresist pattern and a second photoresist pattern on a substrate (103, 204); forming a recess at the outer edge, close to the substrate, of the lower part of the first photoresist pattern, and forming a recess at the outer edge, close to the substrate, of the lower part of the second photoresist pattern; and waiting for a first time period, so that photoresist on the surface of the first photoresist pattern flows downwards to fill the recess of the first photoresist pattern, and photoresist on the surface of the second photoresist pattern flows downwards to fill the recess of the second photoresist pattern (104, 205). The method can simplify the spacer preparing process and reduce the spacer preparing costs.
(FR) La présente invention concerne un procédé de préparation d’une pièce intercalaire et un procédé de préparation d’un substrat d’affichage. Le procédé de préparation d’une pièce intercalaire comprend : le surdéveloppement d’une couche exposée de résine photodurcissable pour former un premier motif de résine photodurcissable et un second motif de résine photodurcissable sur un substrat (103, 204) ; la formation d’un renfoncement au niveau du bord externe, près du substrat, de la partie inférieure du premier motif de résine photosensible, et la formation d’un renfoncement au niveau du bord externe, près du substrat, de la partie inférieure du second motif de résine photosensible ; et l’attente pendant une première période, de sorte que la résine photosensible sur la surface du premier motif de résine photosensible s’écoule vers le bas pour remplir le renfoncement du premier motif de résine photosensible, et la résine photosensible sur la surface du second motif de résine photosensible s’écoule vers le bas pour remplir le renfoncement du second motif de résine photosensible (104, 205). Le procédé peut simplifier le procédé de préparation de pièce intercalaire et réduire les coûts de préparation de ladite pièce.
(ZH) 一种隔垫物的制备方法和显示基板的制备方法。该隔垫物的制备方法包括:对经过曝光处理的光刻胶层进行过度显影处理,以在基板上形成第一光刻胶图案和第二光刻胶图案(103,204);在第一光刻胶图案靠近基板的下部的外边缘形成有凹部,在第二光刻胶图案靠近基板的下部的外边缘形成有凹部;等待第一时长,使第一光刻胶图案表面的光刻胶向下流动以填充第一光刻胶图案的凹部,并使第二光刻胶图案表面的光刻胶向下流动以填充第二光刻胶图案的凹部(104,205)。该方法能够简化制备隔垫物的工艺,降低制备隔垫物的成本。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Chinese (ZH)
Filing Language: Chinese (ZH)