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1. (WO2018032464) HIGH-THROUGHPUT CELL LINE SCREENING METHOD FOR CHO-DHFR EXPRESSION SYSTEM
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.:    WO/2018/032464    International Application No.:    PCT/CN2016/095877
Publication Date: 22.02.2018 International Filing Date: 18.08.2016
IPC:
C12N 15/85 (2006.01), C12N 5/10 (2006.01), C12Q 1/02 (2006.01)
Applicants: SUNSHINE LAKE PHARMA CO., LTD. [CN/CN]; Northern Industrial Area, Songshan Lake Dongguan, Guangdong 523000 (CN)
Inventors: LIU, Jing; (CN).
YANG, Bin; (CN).
ZHANG, Caixia; (CN).
CHEN, Hualin; (CN).
CHEN, Li; (CN).
SUEN, Wen-Chen; (CN).
LI, Wenjia; (CN)
Priority Data:
Title (EN) HIGH-THROUGHPUT CELL LINE SCREENING METHOD FOR CHO-DHFR EXPRESSION SYSTEM
(FR) PROCÉDÉ DE CRIBLAGE DE LIGNÉE CELLULAIRE À HAUT DÉBIT POUR SYSTÈME D'EXPRESSION DE CHO-DHFR
(ZH) 一种CHO-Dhfr表达系统细胞株的高通量筛选方法
Abstract: front page image
(EN)A high-throughput cell line screening method for a CHO-Dhfr expression system. The method comprises: performing three rounds of methotrexate stress treatment, selecting a cell pool with 40-50% cell viability, and performing monoclonal conversion in a specific semi-solid nutrient medium.
(FR)L'invention concerne un procédé de criblage de lignée cellulaire à haut débit destiné à un système d'expression de CHO-Dhfr. Le procédé consiste à : réaliser trois cycles de traitement du stress par le méthotrexate, sélectionner un pool de cellules présentant une viabilité cellulaire de 40 à 50 %, et réaliser une conversion monoclonale dans un milieu nutritif semi-solide spécifique.
(ZH)一种CHO- Dhfr表达系统细胞株的高通量筛选方法,该方法采用氨甲喋呤三轮加压,选择细胞活力在40%-50%的细胞池,在特定的半固体培养基中进行单克隆化。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Chinese (ZH)
Filing Language: Chinese (ZH)