Search International and National Patent Collections

1. (WO2018029747) PHOTOSENSITIVE RESIN COMPOSITION, CONDUCTIVE PATTERN PRODUCTION METHOD, SUBSTRATE, TOUCH PANEL, AND DISPLAY

Pub. No.:    WO/2018/029747    International Application No.:    PCT/JP2016/073280
Publication Date: Fri Feb 16 00:59:59 CET 2018 International Filing Date: Tue Aug 09 01:59:59 CEST 2016
IPC: G03F 7/004
G03F 7/033
Applicants: TORAY INDUSTRIES, INC.
東レ株式会社
Inventors: KOBAYASHI, Yasuhiro
小林康宏
SUWA, Mitsuhito
諏訪充史
YAMASHIKI, Yuka
山舖有香
Title: PHOTOSENSITIVE RESIN COMPOSITION, CONDUCTIVE PATTERN PRODUCTION METHOD, SUBSTRATE, TOUCH PANEL, AND DISPLAY
Abstract:
Provided is a photosensitive resin composition capable of both ensuring the resolution of a fine pattern and suppressing the accumulation of residue on a substrate. The photosensitive resin composition comprises conductive particles (A), an alkali-soluble resin (B), and an organotin compound (C), the primary particle size of the conductive particles (A) being 0.7 μm or less.