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1. (WO2018029184) OPTICAL SYSTEM AND METHOD FOR CORRECTING MASK DEFECTS USING THE SYSTEM

Pub. No.:    WO/2018/029184    International Application No.:    PCT/EP2017/070047
Publication Date: Fri Feb 16 00:59:59 CET 2018 International Filing Date: Wed Aug 09 01:59:59 CEST 2017
IPC: G03F 1/72
G02B 21/00
Applicants: CARL ZEISS SMT GMBH
CARL ZEISS SMS LTD.
Inventors: SEESSELBERG, Markus
DMITRIEV, Vladimir
WELTE, Joachim
STERN, Uri
COHEN, Tomer
GRAITZER, Erez
Title: OPTICAL SYSTEM AND METHOD FOR CORRECTING MASK DEFECTS USING THE SYSTEM
Abstract:
The invention concerns an optical system comprising a scanning unit, a first lens- element group comprising at least a first lens element, a focusing unit which is designed to focus beams onto a focus, wherein the focusing unit comprises a second lens- element group comprising at least a second lens element and an imaging lens. The imaging lens further comprises a pupil plane and a wavefront manipulator. The wavefront manipulator of the optical system is arranged in the pupil plane of the imaging lens or in a plane that is conjugate to the pupil plane of the imaging lens, or the scanning unit of the optical system is arranged in a plane that is conjugate to the pupil plane of the imaging lens and the wavefront manipulator is arranged upstream of the scanning unit in the light direction. The focus of the second lens-element group lies in the pupil plane of the imaging lens in all focal positions of the focusing unit.