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1. (WO2018029053) BOTTOM ANTIREFLECTIVE COATING FORMING COMPOSITION
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Pub. No.: WO/2018/029053 International Application No.: PCT/EP2017/069501
Publication Date: 15.02.2018 International Filing Date: 02.08.2017
IPC:
G03F 7/09 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
09
characterised by structural details, e.g. supports, auxiliary layers
Applicants:
AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. [LU/LU]; 46 Place Guillaume II 1648 Luxembourg, LU
Inventors:
HITOKAWA, Hiroshi; JP
TAKAICHI, Tetsumasa; JP
KAWATO, Shunji; JP
KATAYAMA, Tomohide; JP
Agent:
B2B PATENTS; c/o Merck Patent GmbH 64271 Darmstadt, DE
Priority Data:
2016-15690009.08.2016JP
Title (EN) BOTTOM ANTIREFLECTIVE COATING FORMING COMPOSITION
(FR) COMPOSITION FORMANT UN REVÊTEMENT ANTIRÉFLÉCHISSANT DE FOND
Abstract:
(EN) [Problem to be Solved] To provide a bottom antireflective coating forming composition which can show high etching resistance and can be crosslinked even at a relatively low temperature. Further, to provide a resist pattern manufacturing method and a device manufacturing method using the same. [Solution] The bottom antireflective coating forming composition comprises: a polymer A comprising specific repeating units; a low molecular crosslinking agent having a molecular weight of 1 00 to 3,000; and a solvent. The resist pattern manufacturing method and the device manufacturing method using the same are also provided.
(FR) La présente invention concerne une composition formant un revêtement antiréfléchissant de fond qui peut présenter une résistance élevée à la gravure, et peut être réticulé même à une température relativement basse. L'invention concerne en outre un procédé de fabrication de motif de réserve et un procédé de fabrication d'un dispositif utilisant celui-ci. La composition formant un revêtement antiréfléchissant de fond comprend : un polymère A comprenant des motifs répétés spécifiques ; un agent de réticulation de faible poids moléculaire présentant un poids moléculaire compris entre 100 et 3000 ; et un solvant. L'invention se réfère également au procédé de fabrication du motif de réserve et au procédé de fabrication de dispositif utilisant celui-ci.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)