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1. (WO2018028880) ALIGNMENT MARK RECOVERY METHOD AND LITHOGRAPHIC APPARATUS

Pub. No.:    WO/2018/028880    International Application No.:    PCT/EP2017/066267
Publication Date: Fri Feb 16 00:59:59 CET 2018 International Filing Date: Sat Jul 01 01:59:59 CEST 2017
IPC: G03F 9/00
H01L 23/544
Applicants: ASML NETHERLANDS B.V.
Inventors: SANCHEZ-FABRES COBALEDA, Cayetano
LALBAHADOERSING, Sanjaysingh
Title: ALIGNMENT MARK RECOVERY METHOD AND LITHOGRAPHIC APPARATUS
Abstract:
The invention relates to a method for recovering alignment marks in a mark layer of a substrate, comprising the steps of: a) providing a substrate with a mark layer covered by a resist layer; b) forming alignment marks in the mark layer, wherein an alignment mark is formed by: exposing the resist layer to a patterned radiation beam thereby forming an alignment pattern in a mark area of the resist; c) forming one or more recovery marks in the mark layer, wherein a recovery mark is formed by: - exposing the resist layer to at least a portion of the patterned radiation beam thereby forming an alignment pattern in a mark area of the resist; and - subsequently exposing the mark area of the resist, each time with a shifted patterned radiation beam until a substantial part of the mark area has been exposed.