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1. (WO2018026571) SYSTEMS AND PROCESSES FOR PRODUCING POLYETHER POLYOLS
Latest bibliographic data on file with the International Bureau    Submit observation

Pub. No.:    WO/2018/026571    International Application No.:    PCT/US2017/043615
Publication Date: 08.02.2018 International Filing Date: 25.07.2017
IPC:
C08G 65/26 (2006.01)
Applicants: COVESTRO LLC [US/US]; 1 Covestro Circle Pittsburgh, Pennsylvania 15205 (US)
Inventors: LAI, Jye-Sheng; (US).
WRAY, William D.; (US).
LENAHAN, Robert A.; (US).
REESE, Jack R.; (US).
MORRISON, Mark D.; (US)
Agent: PALLADINO, Donald R.; (US)
Priority Data:
15/229,657 05.08.2016 US
Title (EN) SYSTEMS AND PROCESSES FOR PRODUCING POLYETHER POLYOLS
(FR) SYSTÈMES ET PROCÉDÉS DE PRODUCTION DE POLYOLS DE POLYÉTHER
Abstract: front page image
(EN)Disclosed are processes and systems for producing polyether polyols and for the recovery of heat generated during such polyether polyol production.
(FR)L'invention concerne des procédés et des systèmes pour produire des polyols de polyéther et pour récupérer la chaleur produite pendant une telle production de polyol de polyéther.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)