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1. (WO2018026412) FABRICATION METHOD FOR DIGITAL ETCHING OF NANOMETER-SCALE LEVEL STRUCTURES

Pub. No.:    WO/2018/026412    International Application No.:    PCT/US2017/033005
Publication Date: Fri Feb 09 00:59:59 CET 2018 International Filing Date: Thu May 18 01:59:59 CEST 2017
IPC: G02B 3/08
G02B 1/10
G02B 27/09
Applicants: THE GOVERNMENT OF THE UNITED STATES OF AMERICA, as represented by THE SECRETARY OF THE NAVY NAVAL RESEARCH LABORATORY
Inventors: CHRISTOPHERSEN, Marc
PHLIPS, Bernard, F.
YETZBACHER, Michael, K.
Title: FABRICATION METHOD FOR DIGITAL ETCHING OF NANOMETER-SCALE LEVEL STRUCTURES
Abstract:
A device includes a surface profile optical element, including a substrate and a plurality of bi-Iayer stacks on the substrate. Each bi-layer stack of the plurality of bi-layer stacks includes- a plurality of bi-layers. Each bi-layer of the plurality of bi-layers includes an etch-Stop layer and a bulk layer. The etch stop layer includes an etch stop layer index of refraction. The bulk layer includes a bulk layer index of refraction. A ratio of the etch stop layer index of refraction: and the bulk layer index of refraction is between 0.75 and 1.25.