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1. (WO2018022371) EXTREME ULTRAVIOLET MASK BLANK WITH MULTILAYER ABSORBER AND METHOD OF MANUFACTURE

Pub. No.:    WO/2018/022371    International Application No.:    PCT/US2017/042747
Publication Date: Fri Feb 02 00:59:59 CET 2018 International Filing Date: Thu Jul 20 01:59:59 CEST 2017
IPC: G03F 1/22
G03F 1/50
G03F 7/20
G03F 7/09
Applicants: APPLIED MATERIALS, INC.
Inventors: JINDAL, Vibhu
Title: EXTREME ULTRAVIOLET MASK BLANK WITH MULTILAYER ABSORBER AND METHOD OF MANUFACTURE
Abstract:
Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a multilayer stack of absorber layers on the capping layer, the multilayer stack of absorber layers including a plurality of absorber layer pairs.