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1. (WO2018021021) GAS BARRIER MEMBRANE, GAS BARRIER FILM USING SAME, ELECTRONIC DEVICE USING SAID GAS BARRIER MEMBRANE OR SAID GAS BARRIER FILM, AND PRODUCTION METHOD FOR GAS BARRIER MEMBRANE

Pub. No.:    WO/2018/021021    International Application No.:    PCT/JP2017/025316
Publication Date: Fri Feb 02 00:59:59 CET 2018 International Filing Date: Wed Jul 12 01:59:59 CEST 2017
IPC: C23C 14/06
B32B 9/00
C23C 14/08
C23C 16/42
Applicants: KONICA MINOLTA, INC.
コニカミノルタ株式会社
Inventors: MORI, Takahiro
森 孝博
Title: GAS BARRIER MEMBRANE, GAS BARRIER FILM USING SAME, ELECTRONIC DEVICE USING SAID GAS BARRIER MEMBRANE OR SAID GAS BARRIER FILM, AND PRODUCTION METHOD FOR GAS BARRIER MEMBRANE
Abstract:
The present invention provides a means with which a gas barrier membrane can satisfy both excellent bending properties and high water-vapor barrier properties in a high-temperature, high-humidity environment. The present invention relates to a gas barrier membrane having a region (a) that satisfies the following expression (1) and the following expression (2) when the composition is represented by M1M2xNy in the atomic composition distribution profile obtained when an XPS composition analysis is performed in the thickness direction. M1M2xNy Expression (1): 0.2 ≤ x ≤ 3.0 Expression (2): 0.6 ≤ y ≤ 1.4 x: Abundance ratio of transition metal M2 atoms with respect to non-transition metal M1 atoms y: Abundance ratio of nitrogen atoms with respect to non-transition metal M1 atoms